Transreflective LCD Array Substrate Manufacturing Process
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The manufacturing process for transreflective liquid crystal display (LCD) array substrates requires additional steps and masks compared to transmissive or reflective LCDs, increasing production costs and complexity due to the need for forming both a reflective plate and an embossing pattern, which complicates the process and increases mask usage.
Innovation Solution
A method involving a pre-preparing layer and a post-preparing layer is developed, using a series of patterning processes with full tone and dual tone masks to form gate lines, data lines, reflective plates, thin film transistors, and pixel electrodes, allowing for the formation of embossing patterns without additional processes, thereby reducing mask usage and simplifying the manufacturing process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If embossing pattern formation is added to transreflective LCD manufacturing, then reflection efficiency is improved, but mask number and process complexity increase
Solution Approach 1:
The patent combines the embossing pattern formation process with the pixel electrode formation process into a single integrated step. The embossing pattern is formed on the reflective plate during the same patterning process that creates the pixel electrode, eliminating the need for separate embossing steps and reducing overall process complexity while maintaining improved reflection efficiency
Solution Approach 2:
The reflective plate serves multiple functions: it provides the reflective surface for improved reflection efficiency, and it integrates the embossing pattern formation within its structure. This multi-functional design allows the same component to address both optical performance and process simplification needs
2Illumination intensity
If additional processes are added to form embossing patterns, then reflection efficiency is improved, but production cost increases
Solution Approach 1:
The patent merges embossing pattern formation with pixel electrode formation into one integrated process step. By combining these operations, the patent eliminates redundant process equipment and material consumption, thereby reducing production costs while achieving the desired reflection efficiency improvement through the embossed structures
3Illumination intensity
If mask number is increased for embossing pattern formation, then reflection efficiency is improved, but productivity decreases
Solution Approach 1:
The patent integrates embossing pattern formation into the pixel electrode formation process, allowing both features to be created simultaneously in one patterning operation. This eliminates the need for additional masking steps, maintains high reflection efficiency through proper embossing, and preserves production efficiency by reducing the total number of process cycles required
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method reduces production costs and improves yield by integrating embossing pattern formation into existing processes, eliminating the need for additional steps and masks, thus streamlining the production of transreflective LCD array substrates.
Implementation Method 1
exposing and developing the first photoresist layer with a full tone mask to form a first photoresist pattern
Implementation Method 2
performing etching by using the first photoresist pattern to form an embossing pattern in a reflective portion of a display region and to form a gate line
Implementation Method 3
ashing the remained photoresist layer to thin the patterned photoresist layer
Data Source
AI summary
A method of manufacturing an array substrate of a transreflective LCD is provided in the invention. In the method, a gate line, a common line and an embossing pattern are formed with a full tone mask, a data line, a source/drain electrode, a reflective plate and a TFT channel region are formed with a first dual tone mask, and a pixel electrode connected with the drain electrode is formed with a second dual tone mask, and thus a horizontal electric field type transreflective LCD can be obtained.