Transreflective LCD Array Substrate with Poly-ITO Grain Control
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Solution Overview
Problem
Conventional methods for manufacturing transreflective liquid crystal display array substrates result in large resin projections, increased thickness, complex patterning processes, poor light diffuse reflection, limited emitting angle range, low yield, and increased costs due to the use of resin materials.
Innovation Solution
The method involves forming a gate scanning line, thin film transistor, and passivation layer on a substrate, followed by depositing an amorphous-type indium tin oxide film, crystallizing it to poly-type, and patterning to create a pixel electrode with transmissive and reflective regions, and then depositing a metal film on the reflective region to enhance light diffuse reflection.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If resin projections are used to form the reflective part, then the reflective part can be formed on the array substrate, but the size of the projections becomes relatively large which increases the thickness of the final product
Solution Approach 1:
The invention changes the material parameter from resin to inorganic material (such as silicon nitride or silicon oxide), which allows for smaller projection sizes while maintaining structural integrity, thereby reducing the overall thickness of the final product while still forming the reflective part effectively
Solution Approach 2:
The invention utilizes phase transition by forming inorganic material projections through deposition processes that transition material from vapor phase to solid phase, enabling precise control over projection dimensions and reducing size compared to resin-based approaches
2Ease of manufacture
If patterning process is performed on resin materials to form projections, then the reflective part can be created, but the processes of masking, exposing, and etching are increased by 2-3 times
Solution Approach 1:
The invention merges the formation of the reflective part structure with the pixel electrode formation process by using the same inorganic material layer for both functions, eliminating the need for separate patterning processes and reducing overall process complexity
Solution Approach 2:
The inorganic material layer serves multiple functions simultaneously: it forms the pixel electrode, creates the reflective part projections, and provides structural support, thereby eliminating the need for separate resin material processing steps
3Productivity
If resin projections with large size and large gap are formed by patterning, then the manufacturing process can be completed, but the light diffuse reflection effect is poor and the emitting angle range is limited
Solution Approach 1:
The invention changes the material parameter from resin to inorganic material, which has different optical properties that enhance light diffuse reflection capability, and allows for optimized projection dimensions that improve emitting angle range while maintaining manufacturing feasibility
4Ease of manufacture
If conventional patterning method is used to form the reflective part, then the array substrate can be manufactured, but the manufacturing procedure becomes complicated and the yield is low
Solution Approach 1:
The invention combines the formation of the reflective part with the pixel electrode formation into a single integrated process using inorganic material deposition, eliminating multiple separate patterning steps and thereby simplifying the manufacturing procedure while improving production yield
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the manufacturing process, increases efficiency, reduces costs, and significantly improves light diffuse reflection by controlling the size and distribution of poly-type indium tin oxide grains, enhancing the emitting angle range and overall product quality.
Implementation Method 1
depositing amorphous-type indium tin oxide film after step (a) and heating the substrate at a predetermined temperature thereby achieving a phase-transition at bottom of the indium tin oxide film from amorphous-type into poly-type
Implementation Method 2
Light diffuse reflection can occur on thus formed reflective part to supply light for liquid crystal
Implementation Method 3
depositing and patterning a metal material on the substrate after step (c) thereby forming a metal film on the reflective region pattern
Data Source
AI summary
An embodiment of the invention provides an array substrate for a liquid crystal display comprising a substrate and a gate scanning line, a thin film transistor, a data line, and a passivation layer on the substrate, the passivation layer covering the gate scanning line, the thin film transistor, the data line, and a through hole being formed in the passivation layer. A pixel electrode is formed on the passivation layer and comprises a transmissive part and a reflective part, the transmissive part comprises an amorphous-type indium tin oxide film and a poly-type indium tin oxide film below the amorphous-type indium tin oxide film, and the reflective part comprises the poly-type indium tin oxide film and a metal film covering the poly-type indium tin oxide film.