Trapezoidal Shower Head Assembly for ALD Uniformity

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Solution Overview

Problem

Current atomic layer deposition (ALD) processes face challenges in achieving uniform deposition of reaction precursors on substrates due to non-uniform distribution, often requiring extended process times or increased precursor amounts, which affect efficiency and cost.

Innovation Solution

A shower head assembly with a specific trapezoidal column and nozzle configuration that diffuses reaction precursors uniformly across the chamber, ensuring even distribution and deposition on substrates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the reaction precursor is supplied through the center of the shower head assembly, then the deposition uniformity on the substrate is poor, but modifying the shower head structure to improve uniformity increases device complexity

Engineering Contradiction:
Improvedeposition uniformityVSAvoidshower head structure
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The shower head assembly is divided into multiple functional components: a first trapezoidal column component with a first hollow part, a second trapezoidal column component with a second hollow part, and a column component with multiple nozzles. This segmentation allows the reaction precursor to be distributed through multiple pathways, improving deposition uniformity across the substrate while maintaining a modular structure that manages complexity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent transitions from a single-center supply approach to a multi-dimensional distribution system. The first and second hollow parts create vertical and radial dimensions for precursor distribution, while the column component with multiple nozzles adds another dimension of distribution at the shower head outlet, enabling uniform coverage across the substrate surface.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Reliability

If the reaction precursor stays in the chamber longer to fully react with the substrate, then the reaction completeness improves, but the process time increases reducing productivity

Engineering Contradiction:
Improvereaction completenessVSAvoidprocess efficiency
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The shower head assembly pre-distributes the reaction precursor uniformly across the chamber space through its multi-component structure before the precursor contacts the substrate. This preliminary uniform distribution ensures that when the precursor reacts with the substrate, the reaction proceeds completely and uniformly across the entire substrate surface, achieving high reaction completeness without requiring extended process times.

Inventive Principle:
Principle #10Preliminary action

3Manufacturing precision

If the amount of reaction precursor is increased to compensate for poor periphery coverage, then the deposition uniformity improves, but the cost expenditure increases

Engineering Contradiction:
Improvedeposition uniformityVSAvoidprecursor amount
Core Design Contradiction:
Manufacturing precisionVSQuantity of substance

Solution Approach 1:

The shower head assembly creates local quality variations in precursor distribution through its structured design. The first trapezoidal column component with its hollow part directs precursor flow to specific regions, while the second trapezoidal column component and column component with nozzles ensure that peripheral regions receive adequate precursor supply. This localized optimization of precursor distribution achieves uniform deposition without requiring a proportional increase in total precursor amount.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution achieves improved deposition uniformity without increasing process time or costs, ensuring consistent material deposition on substrates.

Implementation Method 1

the reaction precursor is diffused to the full range of the shower head assembly (that is, from the inside to the outside)

Methodology Applied
Scientific EffectDiffusion: Diffusion

Implementation Method 2

reaction precursor is chemically adsorbed on a material surface of the substrate or the previous film to produce a thin film with uniform deposition

Methodology Applied
Scientific EffectChemical adsorption: Adsorption

Data Source

PatentUS11535938B2Shower head assembly and atomic layer deposition device
Publication Date: 2022.12.27 SKYTECH
  • US11535938B2 patent drawing
  • US11535938B2 patent drawing
  • US11535938B2 patent drawing

AI summary

A shower head assembly of an atomic layer deposition device has a first trapezoidal column component, a second trapezoidal column component and a column component, wherein a first bottom edge of the first trapezoidal column component is connected to a second top edge of the second trapezoidal column component, and a second bottom edge of the second trapezoidal column component is connected to a top edge of the column component. The first trapezoidal column component has a first bottom dimension distance, the second trapezoidal column component has a second vertical distance, and the column component has a column vertical distance, wherein a ratio of the column vertical distance to the second vertical distance is greater than or equal to 1.2, and a total distance of the second vertical distance and the column vertical distance is less than the first bottom dimension distance.