Substrate Treating Vessel Layout for Recollecting Path Cleaning

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Solution Overview

Problem

Existing substrate treating vessels face challenges in completely cleaning residual photosensitive solutions from their recollecting paths, leading to contamination and difficulty in maintaining cleanliness.

Innovation Solution

The substrate treating apparatus features a treating vessel with an outer and inner cup configuration, including a rotatable spin head and a cleaning jig, where a first protrusion directs cleaning liquid towards the inner cup surface, enhancing the cleaning efficiency of residual photosensitive solutions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If a cleaning liquid is supplied from above and below the cleaning jig toward the cleaning jig, then the cleaning process can be performed, but the cleaning liquid does not reach some regions (upper regions x and lower region y) of the treating vessel, making it very difficult to clean residual photosensitive solution

Engineering Contradiction:
Improvecleaning easeVSAvoidcleaning completeness
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

The invention introduces a new dimension to the cleaning liquid flow by adding a lateral flow component through the side wall nozzle. Instead of only vertical flow from above and below, the cleaning liquid now flows horizontally along the recollecting path, reaching previously inaccessible upper regions and ensuring complete cleaning coverage of all treating vessel surfaces

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Device complexity

If the treating vessel structure is simple, then the device complexity is low, but the cleaning liquid cannot reach all regions including upper regions higher than the substrate

Engineering Contradiction:
Improvevessel structure complexityVSAvoidcleaning accessibility
Core Design Contradiction:
Device complexityVSEase of operation

Solution Approach 1:

The invention segments the cleaning function by adding a separate side wall nozzle positioned at a specific height. This segmentation allows the cleaning liquid to be delivered to different regions of the treating vessel through multiple nozzle positions, enabling access to upper regions without requiring complete structural redesign of the vessel

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design facilitates easier cleaning of residual processing liquids, reducing contamination risks and improving the overall cleanliness and efficiency of the substrate treating process.

Implementation Method 1

the first protrusion may be formed to protrude such that the cleaning liquid scattering from the cleaning jig collides with the first protrusion

Methodology Applied
Scientific EffectCollision: Impact Force

Data Source

PatentUS12341027B2Treating vessel and liquid processing apparatus
Publication Date: 2025.06.24 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US12341027B2 patent drawing
  • US12341027B2 patent drawing
  • US12341027B2 patent drawing

AI summary

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus comprising: a treating vessel including an outer cup and an inner cup placed in an inner side of the outer cup, the inner cup and the outer cup in combination defining a recollecting route for a recollecting a liquid; a rotatable spin head placed within the treating vessel on which a cleaning jig is placed; wherein the treating vessel comprises a first protrusion protruding from an inner side surface of the outer cup to direct a cleaning liquid scattering from the cleaning jig toward a surface of the inner cup.