Treatment Module Chamber-in-Chamber Segmentation
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Solution Overview
Problem
Low-cost continuous systems for manufacturing flat products, such as solar cells, face challenges in achieving high gas purity and quality due to increased demands, which existing technologies struggle to meet at a reasonable cost.
Innovation Solution
A process module design featuring a chamber-in-chamber structure where the carrier device forms the bottom of the process chamber, allowing for improved separation from external atmosphere and auxiliary devices, reducing impurity concentration and enhancing temperature accuracy, while minimizing internal volume for reduced pumping, rinsing, and ventilation times.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a single chamber design is used, then system costs are reduced, but gas purity and temperature control accuracy deteriorate
Solution Approach 1:
The system is divided into two separate chambers: a process chamber for substrate treatment and a module chamber containing auxiliary devices. This segmentation allows independent optimization of each chamber - the process chamber can be evacuated to high vacuum for pure plasma processing, while the module chamber houses pumping and control devices without compromising the process environment.
Solution Approach 2:
A partition wall with a selectively permeable membrane separates the process chamber from the module chamber. The membrane allows controlled gas exchange and pressure differential maintenance, enabling the process chamber to achieve high vacuum purity while the module chamber operates at higher pressure for auxiliary device functionality.
2Device complexity
If a single chamber design is used, then device complexity is reduced, but temperature control accuracy deteriorates
Solution Approach 1:
The chamber is segmented into process and module sections with thermal isolation. This allows independent temperature control of the process chamber without interference from heat-generating auxiliary devices in the module chamber, improving temperature stability and control accuracy.
Solution Approach 2:
The partition wall acts as a thermal barrier between the process chamber and module chamber. This intermediary structure prevents heat transfer from pumping and control devices to the substrate processing area, maintaining stable temperature conditions for precise plasma processing.
3Volume of stationary object
If the carrier device forms the bottom of the process chamber, then internal volume is minimized, but manufacturing precision requirements increase
Solution Approach 1:
The carrier device serves multiple functions simultaneously: it transports substrates through the process line, forms the bottom boundary of the process chamber, and acts as a sealing surface for the partition wall. This multi-functionality minimizes the need for separate structural components, reducing overall chamber volume while maintaining precision through integrated design.
Solution Approach 2:
The carrier device's own structure is utilized to define the process chamber boundary rather than requiring a separate bottom plate. The precision carrier device, already manufactured to high tolerances for substrate handling, automatically provides the necessary positioning and sealing functions, eliminating additional manufacturing steps.
Data Source
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AI summary
The invention relates to a treatment module comprising at least one evacuable treatment chamber located in the treatment module and at least one support device which can be moved horizontally through the treatment module in at least one substrate transport direction for accommodating respectively at least one flat substrate which is to be treated in the treatment chamber. The aim of the invention is to provide a treatment module of the above-mentioned type which enables all substrates to be treated in a uniform manner and in a manner so as to achieve a high quality and at a high production speed, with lowest possible system costs. Said aim is achieved due to the above-mentioned type of treatment module in which the at least one treatment chamber can be physically closed with respect to the treatment module by means of the support device, the position of which can be modified in at least one closing direction transverse to the substrate transport direction. The at least one support device forms a base of the at least one treatment chamber.