Trench-Gate Semiconductor Layout for Active Clamp On-Resistance Control

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Solution Overview

Problem

Existing semiconductor devices face challenges in managing on-resistance and channel utilization rate during active clamping operations, which affects their performance and reliability.

Innovation Solution

The semiconductor device incorporates a configuration with multiple insulated gate transistors and a monitoring transistor, where the main transistor and monitoring transistor are designed to have different on-resistance characteristics during active clamping and normal operations, utilizing a control IC with active clamp and overcurrent protection circuits to manage these characteristics.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If multiple insulated gate transistors are used with different on-resistance characteristics, then on-resistance management during active clamping is improved, but device complexity increases

Engineering Contradiction:
Improveon-resistance managementVSAvoiddevice complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The main transistor is divided into multiple insulated gate transistors (first through fourth transistors) with different on-resistance characteristics. Each transistor is independently controlled during active clamping operations, allowing selective engagement of transistors based on current requirements. This segmentation enables fine-grained control of on-resistance while maintaining manageable device complexity through modular architecture.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The device employs dynamic control of transistor on-resistance characteristics during active clamping operations. The control circuit adjusts which transistors are active and their respective resistance states based on real-time operating conditions. This dynamic adaptation allows the system to optimize on-resistance management without requiring permanent complex hardware configurations.

Inventive Principle:
Principle #15Dynamics

2Productivity

If channel utilization rate is increased during active clamping, then device performance is improved, but control difficulty increases

Engineering Contradiction:
Improvechannel utilization rateVSAvoidcontrol difficulty
Core Design Contradiction:
ProductivityVSEase of operation

Solution Approach 1:

The device incorporates feedback mechanisms where the control circuit monitors the operating state of multiple insulated gate transistors and adjusts their control signals accordingly. During active clamping, the system feedbacks information about current distribution and transistor states to optimize channel utilization. This feedback loop simplifies control by automatically balancing channel usage across transistors based on their individual characteristics.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The control circuit dynamically changes operating parameters (gate voltages, current distribution) of the insulated gate transistors during active clamping operations. By adjusting these parameters in real-time, the system optimizes channel utilization rate without requiring complex manual control. The parameter changes adapt to the specific on-resistance characteristics of each transistor, simplifying overall control while maximizing productivity.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20240282851A1Semiconductor device
Publication Date: 2024.08.22 ROHM CO LTD
  • US20240282851A1 patent drawing
  • US20240282851A1 patent drawing
  • US20240282851A1 patent drawing

AI summary

The present disclosure provides a semiconductor device. The semiconductor device includes a main transistor, a monitoring transistor and a pair of separation portions selectively formed in a gate space sandwiched between adjacent trench gate structures. A body region is separated into a monitoring body region sandwiched between the pair of separation portions and a main body region at an opposite side of the monitoring body region across the pair of separation portions. The trench gate structures include: a first gate structure adjacent to the monitoring body region and the main body region along a first direction; and a second gate structure adjacent to the pair of separation portions. The first gate structure is a multi-electrode structure and the second gate structure is a single-electrode structure.