Triboelectric Generator Using Self-Poled Nylon-11 Nanowires

The patent applies preliminary action by pre-forming the Nylon-11 material with the desired crystalline structure and polarized state before incorporating it into the TENG device. The gas-flow assisted nano-template method creates self-poled nanowires during the fabrication process itself, eliminating the need for subsequent poling operations. This preliminary structuring of the material resolves the contradiction by achieving high performance through simplified processing.

The patent replaces the traditional mechanical stretching and electrical poling processes with a gas-flow assisted infiltration method. Instead of applying mechanical stress and high voltage fields to achieve the desired material structure, the invention uses controlled gas flow through nano-templates to deposit and structure the Nylon-11 material in its final functional state during fabrication, thereby eliminating complex post-processing steps.

The patent merges multiple process steps into a single integrated operation. The gas-flow assisted nano-template method combines material deposition, crystallization, and polarization induction into one simultaneous process. As the gas flows through the nano-template and deposits Nylon-11, the material self-organizes into the desired crystalline structure and polarized state in real-time, achieving high surface charge density without sequential processing steps, thereby reducing manufacturing time.

The patent applies self-service by enabling the Nylon-11 material to self-organize and self-pole during the deposition process. The gas-flow assisted infiltration causes the material to automatically form the desired crystalline structure and charge distribution through the constraints and fields present during fabrication, without requiring external stretching or poling interventions. This self-structuring capability eliminates time-consuming post-processing operations.

The patent changes the processing parameters from extreme conditions to controlled, moderate conditions. Instead of applying high stress, high voltage, or extreme temperatures to achieve crystallinity and polarization, the gas-flow assisted nano-template method uses controlled gas flow rates, temperature gradients, and pressure differentials during deposition. These modified parameters achieve the same or better material structure under more manageable and scalable manufacturing conditions.

The patent introduces a gas flow as an intermediary medium to achieve the desired material structure. The gas serves as a carrier that delivers the Nylon-11 precursor through the nano-template while simultaneously providing the thermal and mechanical conditions needed for crystallization and polarization. This intermediary approach replaces direct application of extreme conditions with a more controlled indirect process, improving ease of manufacture while maintaining high crystallinity.