TSV Shield Structure for Crosstalk Prevention in Semiconductor Devices

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Solution Overview

Problem

The close proximity of through-substrate vias (TSVs) in semiconductor structures leads to crosstalk between currents, which can be influenced by electric and magnetic fields, necessitating a solution to prevent interference and maintain signal integrity.

Innovation Solution

A semiconductor structure is designed with a shield structure surrounding the TSVs, electrically isolated and connected to power or ground terminals, to create a shielding effect that prevents crosstalk by maintaining a stable voltage, typically zero, and is made of the same material as the TSVs, with dielectric layers and circuit layers forming redistribution layers for efficient electrical connections.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If TSVs are placed close together to achieve high integration, then productivity and miniaturization are improved, but crosstalk between currents occurs due to electric and magnetic field interference

Engineering Contradiction:
Improveintegration densityVSAvoidcrosstalk interference
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

A shield structure made of conductive material is introduced as an intermediary element between adjacent TSVs. This shield structure is electrically isolated from the TSVs using a dielectric layer, creating a barrier that blocks electric and magnetic field interference while allowing the TSVs to maintain close spacing for high integration

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The space between TSVs is segmented by introducing a shield structure that divides the electromagnetic field environment. The shield structure, surrounded by dielectric material, creates separate electromagnetic zones around each TSV, preventing field interference from propagating between adjacent vias

Inventive Principle:
Principle #1Segmentation

2Reliability

If a shield structure is added to prevent crosstalk, then signal integrity is improved, but device complexity increases

Engineering Contradiction:
Improvesignal integrityVSAvoidstructure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The shield structure serves multiple functions simultaneously: it acts as an electromagnetic shield to prevent crosstalk, provides structural support between TSVs, and can be integrated with existing circuit layers through electrical connection to ground or power terminals, thereby achieving signal integrity protection without proportionally increasing complexity

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The shield structure effectively prevents crosstalk by isolating the TSVs from interfering electric and magnetic fields, ensuring stable voltage and maintaining signal integrity, even at close distances between TSVs, thereby enhancing the performance of semiconductor components.

Implementation Method 1

the shield structure surrounds the TSV, such that the shielding effect will protect the currents in the TSVs from being influenced by the electric fields and the magnetic fields generated by other currents in the TSVs

Methodology Applied
Scientific EffectElectromagnetic shielding: Faraday Cage

Data Source

PatentUS10566294B2Semiconductor structure
Publication Date: 2020.02.18 NAN YA TECH
  • US10566294B2 patent drawing
  • US10566294B2 patent drawing
  • US10566294B2 patent drawing

AI summary

A semiconductor structure is provided. The semiconductor structure includes a substrate, at least one semiconductor device, a through-substrate via (TSV), and a shield structure. The substrate has a front side surface and a back side surface. The semiconductor device is disposed on the front side surface. The TSV is disposed in the substrate. The TSV is exposed by the front side surface and the back side surface, and the TSV is electrically connected to the semiconductor device. The shield structure is disposed in the substrate and surrounds the TSV. The shield structure is exposed by the front side surface, the shield structure is electrically isolated from the TSV, and the shield structure and the TSV have bottom ends at the same height.