Tube Assembly Gas Flow Path Design for Uniform Thin Film Formation
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in inducing a laminar flow of process gas, leading to non-uniform thin film formation and inefficient gas usage, as the space between substrates is not effectively divided, resulting in excessive gas wastage and reduced productivity.
Innovation Solution
A substrate processing apparatus with a tube assembly that includes laminated plates with protrusion parts to create a path for process gas flow, isolation plates to divide processing spaces, and a gas supply and exhaust system to concentrate gas supply to the top surface of substrates, promoting laminar flow and uniform gas distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If process gas is supplied into the processing chamber without dividing the space, then the apparatus structure remains simple, but the laminar flow cannot be effectively induced and uniform thin film formation deteriorates
Solution Approach 1:
The processing chamber space is divided into multiple processing spaces by introducing isolation plates between substrates. Each isolation plate creates a separate processing space that confines the process gas flow, enabling laminar flow induction and uniform thin film formation on each substrate without requiring complex overall chamber redesign
Solution Approach 2:
Isolation plates are introduced as intermediary structures between substrates to control gas flow. These plates act as mediators that guide the process gas through defined paths, ensuring laminar flow and uniform distribution to substrate surfaces while maintaining a relatively simple apparatus structure
2Productivity
If process gas is supplied without space division, then the gas supply system remains simple, but process gas is wasted through circumference and bottom surface, reducing processing efficiency
Solution Approach 1:
The processing chamber is segmented into discrete processing spaces by isolation plates, confining process gas to specific regions. This segmentation prevents gas from diffusing uselessly to chamber circumference and bottom surfaces, reducing gas wastage and improving processing efficiency
Solution Approach 2:
Each processing space is given localized control through isolation plates, creating distinct gas flow environments for each substrate. This local quality control ensures process gas is concentrated where needed (at substrate surfaces) rather than dispersed throughout the entire chamber, reducing wastage and enhancing efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus ensures uniform thin film formation on substrates by concentrating process gas supply to the top surface, reducing wastage and enhancing processing efficiency by inducing a laminar flow, thereby improving the quality and productivity of the substrate processing process.
Implementation Method 1
a substrate processing apparatus that induces a laminar flow to supply a uniform amount of process gas to a top surface of a substrate
Implementation Method 2
a process gas is supplied into the processing chamber through the process gas supply nozzle
Implementation Method 3
an exhaust line through which the gas in the processing chamber is exhausted
Data Source
AI summary
In accordance with an exemplary embodiment, a substrate processing apparatus includes: a tube assembly having an inner space in which substrates are processed and assembled by laminating a plurality of laminates, a substrate holder configured to support the plurality of substrates in a multistage manner in the inner space of the tube assembly, a gas supply unit installed on one side of the tube assembly to supply a process gas to each of the plurality of substrates in the inner space; and an exhaust unit connected to the tube assembly to exhaust the process gas supplied into the inner space, the substrate processing apparatus that induces a laminar flow to supply a uniform amount of process gas to a top surface of the substrate.