Tunable Band-Pass Filter Using Coplanar Waveguide on SOI

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Solution Overview

Problem

Existing high performance band-pass filters embedded in system-on-a-chip (SOC) using MEMS or PCBs face integration challenges with very-large-scale integration (VLSI) structures, particularly in millimeter-wave and microelectronics devices, due to difficulties in integrating MEMS capacitors and metal-air-metal capacitors.

Innovation Solution

A tunable band-pass filter design is implemented using a silicon-on-insulator substrate with a metal shielding layer and a band-pass filter device featuring a MOS varactor, which includes a first port, a second port, and a coupling metal between them, arranged in a coplanar waveguide configuration to enhance coupling effects and reduce direct coupling with the substrate, allowing for improved RF signal transfer and filter characteristics.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If MEMS or PCB structures are used for band-pass filters, then filter performance is improved, but integration difficulty with VLSI increases

Engineering Contradiction:
Improvefilter performanceVSAvoidintegration difficulty
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent merges the band-pass filter device with the silicon-on-insulator substrate and coplanar waveguide structure to form an integrated filter system. The filter device is positioned above the substrate with coupling metal extending between ports, eliminating the need for separate MEMS or PCB components while maintaining filter performance and enabling VLSI integration.

Inventive Principle:
Principle #5Merging (Combining)

2Adaptability or versatility

If traditional off-chip capacitors are used, then resonate frequency adjustment is enabled, but physical area increases

Engineering Contradiction:
Improveresonate frequency adjustmentVSAvoidphysical area
Core Design Contradiction:
Adaptability or versatilityVSArea of stationary object

Solution Approach 1:

The patent transitions from planar off-chip capacitor layouts to a three-dimensional integrated structure where the band-pass filter device is positioned above the silicon-on-insulator substrate. This vertical stacking enables frequency adjustment functionality while reducing the lateral physical area occupied by the filter components.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Reliability

If coupling metal is positioned between ports, then coupling effects are enhanced, but direct coupling with substrate increases

Engineering Contradiction:
Improvecoupling effectsVSAvoiddirect coupling with substrate
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The patent introduces the silicon-on-insulator substrate as an intermediary layer between the coupling metal and the underlying substrate. The substrate acts as a mediator that enables controlled coupling between ports while preventing unwanted direct coupling with the substrate through its insulating properties, thus enhancing desired coupling effects while blocking harmful direct coupling.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design enhances coupling effects, reduces physical area, and provides a higher tuning range and accuracy for resonate frequency, facilitating integration with VLSI structures and reducing the size of high performance tunable band-pass filters.

Implementation Method 1

a band-pass filter device featuring a MOS varactor, which includes a first port, a second port, and a coupling metal between them, arranged in a coplanar waveguide configuration to enhance coupling effects and reduce direct coupling with the substrate

Methodology Applied
Scientific EffectElectromagnetic coupling: Electromagnetic Induction

Implementation Method 2

A representative filter comprises a silicon-on-insulator substrate having a top surface, a metal shielding positioned above the top surface of the silicon-on-insulator substrate

Methodology Applied
Scientific EffectDielectric isolation: Dielectric

Implementation Method 3

at least one layer of metal shielding is positioned above the top surface of the silicon-on-insulator substrate. The metal shielding layer can prevent AC signal of the coplanar waveguide structure from passing below the coplanar waveguide structure

Methodology Applied
Scientific EffectElectromagnetic shielding: Faraday Cage

Data Source

PatentUS8946832B2Filter using a waveguide structure
Publication Date: 2015.02.03 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US8946832B2 patent drawing
  • US8946832B2 patent drawing
  • US8946832B2 patent drawing

AI summary

A representative filter comprises a silicon-on-insulator substrate having a top surface, a metal shielding positioned above the top surface of the silicon-on-insulator substrate, and a band-pass filter device positioned above the metal shielding. The band-pass filter device includes a first port, a second port, and a coupling metal positioned between the first and second ports.