Tunable Silicon Grating Couplers for Wavelength Alignment

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Solution Overview

Problem

Grating couplers in photonic integrated circuits face challenges with manufacturing tolerances, wavelength-passband, lateral and angular alignment tolerances, and optical loss, limiting their use in broad-spectrum, wavelength-division-multiplexing interconnects due to sensitivity to center-wavelength variations and tight tolerance requirements.

Innovation Solution

A tunable grating coupler with an alternating pattern of grating trenches and teeth filled with electro-optical material, where an electric potential is applied to modify the refractive index, allowing adjustment of the operating wavelength, position, and angular alignment, thereby improving bandwidth and alignment tolerances.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If the grating period is selected to satisfy the phase-matching condition for a given wavelength, then high diffraction efficiency is achieved, but the grating coupler becomes wavelength-sensitive with narrow bandwidth

Engineering Contradiction:
Improvecoupling lossVSAvoidwavelength bandwidth
Core Design Contradiction:
Loss of energyVSAdaptability or versatility

Solution Approach 1:

The patent introduces a tunable element (such as a phase shifter or variable index material) within the grating structure that allows the effective grating period or refractive index to be dynamically adjusted. This enables the grating coupler to maintain high diffraction efficiency across multiple wavelengths by adapting its phase-matching condition, thereby resolving the contradiction between narrow bandwidth optimization and broad spectral coverage.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent employs a mechanism to change the effective refractive index or physical dimensions of the grating structure after fabrication. By varying parameters such as the index of refraction through electro-optic, thermo-optic, or carrier injection effects, the grating coupler can be retuned to different wavelengths, achieving both high efficiency and broad adaptability.

Inventive Principle:
Principle #35Parameter changes

2Measurement precision

If tight tolerance control is required on silicon-layer thickness and grating trench etch depth to achieve targeted center wavelength, then wavelength accuracy is improved, but manufacturing complexity and cost increase

Engineering Contradiction:
Improvecenter-wavelength accuracyVSAvoidmanufacturing tolerance requirements
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent incorporates a compensation mechanism or calibration feature during the fabrication process that allows for pre-adjustment of the grating parameters. By introducing tunable elements or reference structures during manufacturing, the system can be pre-configured to account for expected variations in silicon-layer thickness and etch depth, reducing the need for extremely tight tolerances while maintaining wavelength accuracy.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent implements a feedback mechanism where the actual center wavelength of each grating coupler is measured and used to adjust subsequent fabrication parameters or apply post-fabrication tuning. This closed-loop approach compensates for manufacturing variations, allowing relaxed tolerances during fabrication while achieving the required wavelength precision through active correction.

Inventive Principle:
Principle #23Feedback

3Ease of operation

If the grating coupler is designed for surface-normal coupling with fixed geometry, then alignment is simplified, but lateral and angular alignment tolerances become very tight

Engineering Contradiction:
Improvealignment simplicityVSAvoidalignment tolerance
Core Design Contradiction:
Ease of operationVSManufacturing precision

Solution Approach 1:

The patent introduces dynamically adjustable elements (such as movable mirrors, tunable lenses, or reconfigurable grating patterns) that allow the coupling angle or beam direction to be adjusted after alignment. This enables the system to accommodate larger initial alignment tolerances by actively compensating for misalignment, thereby maintaining ease of operation while relaxing precision requirements.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent adds an additional degree of freedom to the alignment system, such as introducing vertical adjustment capability alongside lateral positioning, or adding temporal modulation to the coupling process. By operating in multiple dimensions or time domains, the system can achieve robust alignment with larger tolerances in any single dimension.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables a larger optical bandwidth, improved center-wavelength accuracy, and reduced optical loss by allowing post-manufacturing adjustments to alignment and wavelength, enhancing grating coupler performance and yield.

Implementation Method 1

By applying an electric potential to the grating teeth, the electric potential is applied across the electro-optical material to modify an index of refraction of the electro-optical material

Methodology Applied
Scientific EffectElectro-optic effect: Electro-Optic Effects

Data Source

PatentUS9519163B2Tunable silicon grating couplers
Publication Date: 2016.12.13 ORACLE INT CORP
  • US9519163B2 patent drawing
  • US9519163B2 patent drawing
  • US9519163B2 patent drawing

AI summary

A photonic integrated circuit (PIC) is described. This PIC includes a grating coupler for surface-normal coupling that has an alternating pattern of grating teeth and grating trenches, where the grating trenches are filled with an electro-optical material. By applying an electric potential to the grating teeth, the index of refraction of the electro-optical material can be modified.