Tunable Supercontinuum Light Source for Precision Lithography
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Solution Overview
Problem
Current lithographic technologies face challenges in reproducing patterns with high precision and small features due to the limitations of existing wavelength ranges, requiring sophisticated fine-tuning steps and tight control loops to overcome the classical resolution limit.
Innovation Solution
A wavelength-controllable light source system comprising one or more light sources, a supercontinuum generator, a tunable filter, and a nonlinear amplifier to generate and control light pulses with adjustable wavelengths for precise pattern transfer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional light sources with fixed wavelengths are used, then the lithographic apparatus can operate with established parameters, but the ability to form smaller features and achieve high precision pattern reproduction is limited
Solution Approach 1:
The patent implements a dynamic wavelength control system using a tunable filter that can adjust the output wavelength of the light source in real-time. This allows the lithographic apparatus to adapt to different feature sizes and optimization requirements, resolving the contradiction between fixed operational parameters and the need for high precision pattern reproduction.
Solution Approach 2:
The system changes the wavelength parameter dynamically by passing light through a tunable filter with adjustable transmission characteristics. This enables continuous tuning of the light source parameters to match the requirements of different lithographic processes, improving both precision and adaptability.
2Manufacturing precision
If multiple light sources and complex optical paths are used to achieve wavelength control, then the capability to form smaller features improves, but the device complexity increases
Solution Approach 1:
The patent employs a single light source that serves multiple functions through wavelength tuning. The same light source can be used for different lithographic processes by adjusting the tunable filter, eliminating the need for multiple dedicated light sources and reducing overall system complexity while maintaining high precision capability.
Solution Approach 2:
The tunable filter acts as an intermediary component that simplifies the optical path by allowing a single light source to provide multiple wavelengths. This mediator enables wavelength control without requiring complex multi-source configurations, balancing feature size control capability with device simplicity.
3Manufacturing precision
If tight control loops and sophisticated fine-tuning steps are applied, then the reproduction of patterns at low k1 improves, but the process time and operational complexity increase
Solution Approach 1:
The system performs preliminary wavelength optimization by pre-tuning the tunable filter to the optimal wavelength for a given lithographic process before actual pattern formation. This preliminary action eliminates the need for time-consuming real-time fine-tuning during exposure, maintaining high pattern reproduction quality while reducing process time.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise control of light wavelengths for improved pattern reproduction, enhancing the capability to form smaller features on substrates with reduced complexity and increased efficiency.
Implementation Method 1
a supercontinuum generator on the second optical path, the supercontinuum generator configured to spectrally broaden the low energy pulse into a supercontinuum
Implementation Method 2
a nonlinear amplifier configured to receive the seed pulse and the high energy pulse and generate an amplified light pulse by amplifying the seed pulse with a portion of the high energy pulse
Data Source
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AI summary
Disclosed is a wavelength-controllable light source that includes one or more light sources configured to provide light pulses. There is a first optical path for a high energy pulse from the one or more light sources and a second optical path for a low energy pulse from the one or more light sources. There is a supercontinuum generator on the second optical path, the supercontinuum generator configured to spectrally broaden the low energy pulse into a supercontinuum. A tunable filter on the second optical path is configured to generate a seed pulse by passing the supercontinuum that is within an amplification band. A nonlinear amplifier is configured to receive the seed pulse and the high energy pulse and generate an amplified light pulse by amplifying the seed pulse with a portion of the high energy pulse.