Turntable PVD Magnetron Layout for Uniform Vacuum Coating
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Solution Overview
Problem
Existing vacuum processing systems face challenges in achieving homogeneous substrate coating without the need for substrate rotation and rotating magnet systems, which complicate construction and maintenance.
Innovation Solution
A vacuum processing apparatus with a static magnet arrangement in a PVD deposition source, comprising two closed loops of magnets with opposite polarities, ensures uniform coating by aligning substrate positions with the deposition source without obstructive elements, enhancing deposition homogeneity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a rotating magnet system is used to achieve uniform coating, then coating homogeneity is improved, but device complexity and maintenance difficulty increase
Solution Approach 1:
Instead of rotating the magnet system to achieve uniform coating, the patent inverts the approach by keeping the magnet system static and rotating the substrate holder. This reversal simplifies the magnet system construction and maintenance while still achieving homogeneous coating through the rotational movement of the substrate relative to the stationary magnetic field.
Solution Approach 2:
The patent divides the magnet system into multiple independent magnet assemblies arranged around the substrate holder. Each magnet assembly can be independently positioned and adjusted, allowing for simplified construction and maintenance of individual units while collectively achieving uniform coating distribution across the substrate surface.
2Manufacturing precision
If substrate rotation is implemented to achieve uniform coating, then coating homogeneity is improved, but device complexity increases
Solution Approach 1:
The patent combines the substrate holder rotation function with the magnet assembly positioning system. The substrate holder is integrated with the mechanical structure that positions the magnet assemblies, allowing both substrate rotation and magnet positioning to be achieved through a unified mechanical system, thereby reducing overall device complexity.
3Device complexity
If obstructive elements are present in the deposition path, then device complexity is reduced, but deposition homogeneity deteriorates
Solution Approach 1:
The patent arranges the magnet assemblies and substrate holder in a specific three-dimensional configuration where the magnetic field lines and deposition paths are optimized to avoid obstruction. By carefully designing the spatial relationship between the magnet assemblies, substrate holder, and deposition source, the system achieves homogeneous coating without requiring obstructive shielding elements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Achieves coating homogeneity of less than 1% variation across substrate areas, improving deposition efficiency and reducing maintenance complexity.
Implementation Method 1
A PVD deposition source (14) is attached to said at least one opening (13), wherein said PVD source exhibits at least a circular material target (15) and a static magnet arrangement (11)
Implementation Method 2
PVD or Physical vapor deposition is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of a material onto a surface of a substrate
Data Source
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AI summary
A vacuum treatment apparatus comprising a vacuum treatment recipient (12) with at least one circular opening (13) between an inside (i) and exterior (e) of said recipient (12). Said recipient houses a turntable (1), which defines a plane (P) along its table surface; is drivingly rotatable around a central axis (B) perpendicular to plane (P), and exhibits a plurality of circular substrates supports (2,...9); whereby said at least one opening (13) is arranged such that during a turn of the turntable (1) the area of each of the substrate supports (2,....9) and the opening (13) are fully aligned and completely face each other; the vacuum treatment apparatus further comprising; a PVD deposition source (14) attached to said at least one opening (13), whereby said PVD source exhibits at least a circular material target (15) and the static magnet arrangement (11) and said magnet arrangement is arranged in a plane (M) in parallel to plane (P) and is not rotational symmetric around a central axis (C) running centrally through said magnet arrangement and being perpendicular to said plane (M).