Semiconductor Structure With Two-Stage Accumulation and Lifetime Control
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Solution Overview
Problem
Existing semiconductor devices face challenges in achieving optimal performance due to limitations in carrier injection enhancement and ON-voltage reduction, while also maintaining robust withstand capabilities against latch-up, short-circuit, and RBSOA.
Innovation Solution
The semiconductor device incorporates a two-stage accumulation region with specific doping concentrations and a lifetime control region on both the front and back surfaces of the semiconductor substrate, optimizing the carrier injection enhancement effect and improving withstand capabilities.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a single-stage accumulation region is used, then the structure is simple, but the carrier injection enhancement effect is insufficient and ON-voltage reduction is limited
Solution Approach 1:
The accumulation region is divided into two distinct stages: a first accumulation region with higher doping concentration and a second accumulation region with lower doping concentration. This segmentation allows each stage to contribute differently to carrier injection, enhancing the overall effect while enabling optimization of ON-voltage without excessive complexity
Solution Approach 2:
Different regions of the accumulation structure are assigned different doping concentrations tailored to their specific functions. The first accumulation region uses higher doping for strong carrier injection, while the second uses lower doping for sustained effect, creating local quality variations that optimize performance
2Reliability
If multiple lifetime control regions are added to improve withstand capabilities, then reliability against latch-up and short-circuit improves, but the manufacturing process becomes more complex
Solution Approach 1:
Lifetime control regions are integrated into the existing accumulation region structure rather than being added as separate components. The lifetime control regions are formed in conjunction with the first and second accumulation regions, merging multiple functions into a unified structure that improves reliability without proportionally increasing complexity
Solution Approach 2:
The accumulation region structure serves multiple functions simultaneously: it provides carrier injection enhancement, voltage reduction, and lifetime control for latch-up and short-circuit protection. This multi-functionality reduces the need for separate dedicated structures, balancing reliability improvement with manufacturing complexity
3Manufacturing precision
If precise mask alignment is used to form accumulation regions, then doping precision improves, but manufacturing complexity and potential mask deviations increase
Solution Approach 1:
A stop layer is formed beforehand at the desired depth position before creating the accumulation regions. This preliminary structure serves as a physical reference that guides subsequent doping processes, ensuring precise depth control without requiring complex mask alignment procedures
Solution Approach 2:
The stop layer acts as an intermediary reference structure that mediates between the doping process and the final accumulation region formation. By providing a tangible depth marker, it simplifies the doping process and reduces reliance on complex mask alignment while maintaining high precision
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the carrier injection enhancement effect, reduces the ON-voltage of the transistor portion, and improves the semiconductor device's withstand capabilities against latch-up, short-circuit, and RBSOA, while avoiding mask deviations and simplifying the manufacturing process.
Implementation Method 1
a lifetime control region on both the front surface and the back surface of the semiconductor substrate, thereby optimizing the carrier injection enhancement effect and improving withstand capabilities
Implementation Method 2
The semiconductor device includes a first accumulation region and a second accumulation region, both provided in an epitaxial layer
Data Source
AI summary
Provided is a semiconductor device having a transistor portion and a diode portion, including: a drift region of a first conductivity type provided in a semiconductor substrate; an accumulation region of a first conductivity type provided on a front surface side of the semiconductor substrate with respect to the drift region in the transistor portion and the diode portion; and a first lifetime control region provided on the front surface side of the semiconductor substrate in the transistor portion and the diode portion.


