Ultrasonic Transducer Array for Uniform Glass Etching
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Solution Overview
Problem
Ultrasonic tank designs for glass substrate etching often result in non-uniform etching due to uneven distribution of ultrasonic power, leading to hot spots that can damage the glass and cold spots that hinder efficient etching.
Innovation Solution
The ultrasonic tank features a configuration of transducers around the perimeter of the etching solution tank, ensuring a standard deviation of ultrasonic power within the working area of less than 0.35, with relative power ranging from 0.8 to 1.8, to achieve uniform etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional ultrasonic transducer configurations are used, then ultrasonic etching can be performed, but non-uniform etching occurs due to hot spots and cold spots
Solution Approach 1:
The ultrasonic tank is divided into multiple independent transducer units arranged around the perimeter. Each transducer operates independently and can be controlled individually to achieve uniform power distribution across the working area, eliminating hot spots and cold spots that occur with traditional single or few-transducer configurations.
Solution Approach 2:
Different transducers are positioned at specific locations around the tank perimeter to provide locally optimized ultrasonic energy distribution. The transducer arrangement ensures that each region of the working area receives appropriate ultrasonic power, creating uniform etching conditions throughout the entire substrate area rather than having varying local conditions.
2Productivity
If ultrasonic power is concentrated in certain areas to improve etching efficiency, then etching speed increases, but glass damage occurs due to excessive power
Solution Approach 1:
The total ultrasonic power is segmented across multiple transducers rather than concentrated in one or few units. This allows the system to maintain high overall etching efficiency while distributing the power load, preventing any single area from receiving excessive power that would cause glass damage.
Solution Approach 2:
The transducer arrangement and control system are designed to create equipotential ultrasonic power distribution across the working area. Each transducer contributes equally to the overall etching process, ensuring that all regions experience similar etching rates and power levels, thus maintaining high productivity without localized power excess that would damage the glass.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration ensures consistent etching across the glass substrate, preventing damage from hot spots and ensuring thorough etching in all areas, resulting in uniformly formed via holes with desirable characteristics.
Implementation Method 1
Ultrasonic etching is one option for etching the glass as the ultrasonic energy agitates an etching solution causing it to flow into the pin holes
Implementation Method 2
the ultrasonic energy agitates an etching solution causing it to flow into the pin holes, thereby expediting and improving the enlargement of the holes
Data Source
AI summary
In some embodiments, an ultrasonic tank includes a container, an etching solution tank comprising a working area disposed within the container, and a plurality of ultrasonic transducers arranged about a perimeter of the etching solution tank in a configuration that provides a standard deviation of ultrasonic power within the working area of less than about 0.35.