Undercoat Agent for Block Copolymer Phase Separation

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Solution Overview

Problem

Current methods for forming finer patterns using phase-separated block copolymer structures lack effective control over the position and orientation of nanostructures on substrates, limiting the precision and design flexibility in microelectronic devices.

Innovation Solution

An undercoat agent containing specific resin components with structural units derived from (α-substituted) acrylate esters is used to facilitate phase separation, allowing for the formation of nanostructures with controlled position and orientation on substrates by coating and heat-treating a block copolymer layer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If phase-separated block copolymer structures are used to form finer patterns, then manufacturing precision is improved, but control over position and orientation of nanostructures deteriorates

Engineering Contradiction:
Improvepattern finenessVSAvoidposition and orientation control
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The patent introduces a guide pattern layer as an intermediary between the substrate and the block copolymer layer. This guide pattern serves as a mediator that directs the self-assembly process, enabling both fine pattern formation and controlled position/orientation of the resulting nanostructures. The guide pattern layer with specific chemical properties guides where phase separation occurs, resolving the contradiction between achieving fine patterns and maintaining control.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Ease of operation

If chemical epitaxy with neutralization film is used to control phase-separated pattern, then position and orientation control is improved, but device complexity increases

Engineering Contradiction:
Improvephase-separated pattern controlVSAvoidprocess complexity
Core Design Contradiction:
Ease of operationVSDevice complexity

Solution Approach 1:

The patent controls the phase-separated pattern by adjusting parameters of the guide pattern layer, specifically its chemical composition and surface properties. By changing these parameters, the patent achieves effective control over position and orientation of nanostructures without requiring complex neutralization films or multiple processing steps, thus reducing overall device complexity while maintaining control capability.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables the precise design and formation of nanostructures with controlled orientation and position on substrates, enhancing the precision and flexibility in microelectronic device fabrication.

Implementation Method 1

a self-assembled nanostructure formed by microphase separation must be formed only within a specific region, and must be oriented in the desired direction

Methodology Applied
Scientific EffectMicrophase separation:

Implementation Method 2

phase-separated structures that are formed by the self-assembly of a block copolymer containing mutually incompatible blocks bonded together

Methodology Applied
Scientific EffectSelf-assembly: Self-Assembly

Implementation Method 3

an undercoat agent by which a good pattern is obtained by phase separation of each block copolymer has been required

Methodology Applied
Scientific EffectChemical interaction:

Data Source

PatentUS9567477B2Undercoat agent and method of producing structure containing phase-separated structure
Publication Date: 2017.02.14 TOKYO OHKA KOGYO CO LTD
  • US9567477B2 patent drawing
  • US9567477B2 patent drawing
  • US9567477B2 patent drawing

AI summary

An undercoat agent used for phase separating a layer containing a block copolymer having a block of a structural unit derived from an (α-substituted) acrylate ester on a substrate, and which contains a resin component including a structural unit represented by formula (ba0-1), and/or a structural unit represented by formula (ba0-2), and a structural unit (ba0-3) having a substrate interacting group,wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R1 and R2 represent a halogen atom or an organic group of 1 to 20 carbon atoms which may contain an oxygen atom, a halogen atom, or a silicon atom, and n is 1 to 5.