Underlayer Film Composition for Directed Self-Assembly Lithography
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Solution Overview
Problem
Current directed self-assembly lithography processes face challenges in forming ultrafine patterns with minimal defects and achieving superior alignment orientation and non-corrosiveness to metal substrates, particularly in the formation of underlayer films for semiconductor and liquid crystal devices.
Innovation Solution
A composition comprising specific polymers represented by formulas (1) and (2) is used to form an underlayer film, which includes a solvent and optional components like surfactants and crosslinking agents, enabling phase separation structures with improved adsorbability and alignment orientation, and is applied in a directed self-assembly lithography process involving steps like underlayer film formation, phase separation, and pattern transfer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a block copolymer is used for directed self-assembly to form ultrafine patterns, then pattern formation capability is improved, but alignment orientation and defect reduction are insufficient
Solution Approach 1:
The patent introduces an underlayer film as an intermediary between the metal substrate and the block copolymer. This underlayer film mediates the interaction between the substrate and the self-assembling polymer, providing controlled surface properties that enhance alignment orientation and reduce defects while maintaining the pattern formation capability of the block copolymer.
Solution Approach 2:
The patent modifies the surface free energy parameters of the underlayer film by selecting specific polymer compositions (polystyrene-polymethyl methacrylate random copolymer with controlled styrene content). By changing the compositional parameter of the underlayer film, the surface properties are optimized to improve alignment orientation and reduce defects in the directed self-assembly process.
2Manufacturing precision
If the underlayer film has high adsorbability to metal substrates, then film formation quality is improved, but corrosiveness to metal substrates increases
Solution Approach 1:
The patent changes the compositional parameter of the underlayer film by using a random copolymer with specifically controlled styrene content (5-45 mol%). This parameter optimization achieves the right balance between adsorbability to metal substrates and corrosiveness, ensuring good film formation quality while minimizing substrate damage.
Solution Approach 2:
The patent uses a composite polymer material (random copolymer of polystyrene and polymethyl methacrylate) that combines the beneficial properties of both monomers. The composite structure provides adequate adsorbability for film formation while the polymethyl methacrylate component reduces corrosiveness to the metal substrate compared to pure polystyrene.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables the formation of high-quality patterns with reduced defects and enhanced adsorbability to metal substrates, while maintaining non-corrosiveness, thereby supporting the miniaturization of electronic devices through improved phase separation and alignment orientation in directed self-assembly lithography.
Implementation Method 1
The coating film is phase-separated to form a directed self-assembled film having a plurality of phases
Implementation Method 2
improved adsorbability to metal substrates
Data Source
AI summary
A composition includes: at least one polymer represented by formula (1), formula (2), or both; and a solvent. A1 and A2 are each independently a structural unit having 2 or more carbon atoms; a plurality of A's are the same or different and a plurality of A2s are the same or different; n1 and n2 are each independently an integer of 2 to 500; R1, R2, and R3 are each independently an organic group having 1 or more carbon atoms, or R1 and R2 taken together represent a ring together with X1, Y1, and P; R1 and R2 are the same or different; X1, Y1, and Y2 are each independently a single bond, —O—, or —NR4—; R4 is an organic group having 1 or more carbon atoms; and Z1 and Z2 are each independently hydrogen or an organic group having 1 to 15 carbon atoms.