Undulated Vapor Deposition Mask Substrate for Accurate Etching
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Solution Overview
Problem
Vapor deposition masks face challenges in achieving accurate pattern formation due to vapor deposition material adhering to the wall surfaces of the mask, leading to reduced dimensional accuracy and increased difficulty in achieving the required thickness for reduced adhesion, which narrows processing conditions and complicates etching processes.
Innovation Solution
A vapor deposition mask substrate with an undulated shape in the width direction, where the elongation difference ratio is controlled to be less than or equal to 2×10−5, is used to minimize material adherence and ensure uniform flow of processing liquids, thereby improving the accuracy of pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the thickness of the vapor deposition mask is reduced to reduce the areas of the wall surfaces, then the amount of vapor deposition material adhering to the wall surfaces is reduced and the dimensional accuracy of patterns is improved, but the permissible ranges in etching processing conditions are narrowed and the difficulty of achieving required dimensional accuracy increases
Solution Approach 1:
The invention applies curvature to the inner wall surface of the hole in the vapor deposition mask, specifically forming a curved surface that extends from the first opening toward the second opening. This curved geometry modifies the flow path of vapor deposition material, reducing direct contact with the wall surface and minimizing adhesion. The curvature principle resolves the contradiction by maintaining a thin mask structure (for reduced adhesion) while the specific curved surface geometry ensures uniform etching and maintains manufacturing feasibility despite the reduced thickness
2Loss of substance
If the thickness of the metal sheet is reduced to reduce the thickness of the vapor deposition mask, then the amount of vapor deposition material adhering to the wall surfaces is reduced, but the volume of metal to be removed in etching is reduced and the permissible ranges in processing conditions are narrowed
Solution Approach 1:
The curved surface geometry on the inner wall of the hole is specifically designed to control vapor deposition material flow. The curvature radius and shape are optimized to minimize material adhesion to the wall surface while maintaining structural integrity of the thin mask. This allows the mask to be made thinner (reducing adhesion volume) without compromising the precision of the openings, as the curved surface guides material flow away from the walls
3Ease of manufacture
If the metal sheet has an undulated shape from rolling or electrolysis, then the metal sheet can be manufactured, but the duration for which ridges and valleys are in contact with etchant differs greatly and accuracy is reduced
Solution Approach 1:
The invention introduces a controlled curved surface on the inner wall of the hole that compensates for the undulated shape of the metal sheet. The curvature is designed to create a more uniform effective contact duration between the etchant and different regions of the hole wall, counteracting the variations caused by the undulated substrate. This allows the use of conventionally manufactured metal sheets (with their inherent undulations) while maintaining etching accuracy
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The controlled elongation difference ratio in the vapor deposition mask substrate enhances the uniformity of processing and adhesion, leading to increased accuracy and reduced deviations in pattern formation, improving the overall precision of vapor deposition processes.
Implementation Method 1
The vapor deposition material entering the holes through the second openings forms on the target a pattern corresponding to the position and shape of the first openings
Implementation Method 2
In the process of etching the metal sheet to form holes, a smaller thickness of the metal sheet results in a smaller volume of metal to be removed
Data Source
AI summary
A metal sheet has a longitudinal direction and a width direction. The metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another. Each of the shapes is an undulated shape including protrusions and depressions repeating in the width direction of the metal sheet. A length in the width direction of a surface of the metal sheet is a surface distance. A minimum value of surface distances at different positions in the longitudinal direction of the metal sheet is a minimum surface distance. A ratio of a difference between a surface distance and the minimum surface distance to the minimum surface distance is an elongation difference ratio in the width direction. A maximum value of elongation difference ratios is less than or equal to 2×10−5.