Uneven Nozzle Surface Structure for Stable EUV Target Delivery
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Solution Overview
Problem
The challenge in EUV light generation apparatuses is the reduction of tin repellency on nozzle surfaces due to oxidation, leading to disturbed target substance trajectories and eventual failure of the apparatus, necessitating frequent replacements.
Innovation Solution
A target supply device with a nozzle surface featuring an uneven structure that exhibits enhanced tin repellency, preventing tin particle adhesion and growth, thereby stabilizing target substance trajectories and prolonging apparatus life.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a smooth nozzle surface is used, then the nozzle is easy to manufacture, but tin particle adhesion increases and target substance trajectory becomes disturbed
Solution Approach 1:
The nozzle surface is given a specific roughness (Ra 0.3μm to 3μm) in the region where tin particles may adhere, while other parts of the nozzle maintain normal manufacturing specifications. This localized surface quality change creates tin repellency exactly where needed without requiring complete redesign of the entire nozzle manufacturing process
Solution Approach 2:
The surface roughness parameter is specifically controlled within the range of Ra 0.3μm to 3μm to optimize tin repellency. By changing this physical parameter of the nozzle surface, the apparatus achieves stable target substance trajectory and reduced tin particle adhesion while maintaining manufacturing feasibility
2Productivity
If the nozzle operates for extended periods, then productivity increases, but tin repellency decreases due to oxidation and apparatus failure occurs
Solution Approach 1:
The nozzle surface is pre-treated to create an uneven structure with specific roughness (Ra 0.3μm to 3μm) before the apparatus begins operation. This preliminary surface preparation ensures that tin repellency is established in advance, preventing tin particle adhesion even during extended operation periods when oxidation would normally reduce repellency
Solution Approach 2:
The uneven surface structure acts as a buffer against the deteriorating effect of oxidation. By creating this protective surface characteristic beforehand, the system compensates for the natural loss of tin repellency that occurs during prolonged operation, allowing continuous operation without frequent nozzle replacements
3Reliability
If an uneven structure is formed on the nozzle surface, then tin repellency is enhanced, but manufacturing complexity increases
Solution Approach 1:
The uneven structure is applied only to the specific region of the nozzle where tin particles are likely to adhere, rather than making the entire nozzle complex. This localized approach enhances tin repellency where needed while keeping the overall nozzle structure relatively simple and manufacturable
Solution Approach 2:
Instead of creating a complex geometric uneven structure, the invention controls the surface roughness parameter (Ra 0.3μm to 3μm) through standard manufacturing processes. This parameter-based approach achieves enhanced tin repellency through controlled surface texture rather than complex structural features
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The uneven structure maintains high tin repellency over extended operation times, stabilizing target substance delivery and reducing the frequency of device replacements.
Implementation Method 1
an uneven structure is formed on a surface of the nozzle provided with the nozzle hole and facing the concentration position and exhibits tin repellency larger than tin repellency exhibited by a material of the surface
Implementation Method 2
a laser produced plasma (LPP) type apparatus using plasma generated by irradiating a target substance with laser light
Data Source
AI summary
A target supply device is configured to supply a liquid state target substance including tin to a concentration position of laser light to generate EUV light. The target supply device includes a tank configured to contain the target substance; and a nozzle communicating with an inside of the tank, and having a nozzle hole through which the target substance passes. Here, an uneven structure is formed on a surface of the nozzle provided with the nozzle hole and facing the concentration position and exhibits tin repellency larger than tin repellency exhibited by a material of the surface.