Universal Etchant for Simultaneous Aluminum, Mo, and ITO Patterning
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Solution Overview
Problem
The existing etching processes for flat panel display devices are complex and costly due to the need for different etchant compositions for conductive layers made of aluminum, molybdenum, and indium-tin-oxide, which hinders simultaneous etching and increases manufacturing time and costs.
Innovation Solution
An etchant composition comprising phosphoric acid, nitric acid, acetic acid, a chlorine-based compound, a nitrate-based compound, a sulfate-based compound, an oxidation regulator, and water, which allows for the simultaneous etching of aluminum, molybdenum, and indium-tin-oxide conductive layers, simplifying the patterning process and reducing manufacturing costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If different etchant compositions are used for aluminum, molybdenum, and ITO conductive layers, then each conductive layer can be etched with optimal selectivity, but the etching process becomes complex and manufacturing time increases
Solution Approach 1:
The patent applies universality by developing a single etchant composition that can etch multiple conductive materials (aluminum, molybdenum, and ITO) with different etching rates. The etchant contains phosphoric acid (30-70 wt%), nitric acid (5-20 wt%), and acetic acid (5-30 wt%), creating a universal solution that replaces multiple material-specific etchants, thereby simplifying the process and improving productivity while maintaining acceptable etching selectivity for each material
Solution Approach 2:
The patent applies parameter changes by adjusting the concentrations of phosphoric acid, nitric acid, and acetic acid to achieve different etching rates for different materials. By varying the composition parameters within specific ranges, the etchant can selectively etch aluminum faster, ITO at moderate rate, and molybdenum slower, all in a single bath, thus resolving the contradiction between selectivity and productivity
2Manufacturing precision
If different etching apparatuses are used for different conductive layers, then each layer can be etched with optimized parameters, but device complexity and manufacturing costs increase
Solution Approach 1:
The patent applies universality by creating a single etchant composition that works across different conductive materials, allowing one etching apparatus to perform multiple functions. This eliminates the need for separate optimized apparatuses for each material type, reducing device complexity and manufacturing costs while maintaining etching quality through the chemically optimized universal composition
3Manufacturing precision
If multiple etching processes are implemented for different conductive layers, then etching quality is maintained, but manufacturing costs and productivity are negatively impacted
Solution Approach 1:
The patent applies merging by combining multiple separate etching processes into a single unified etching step. The multi-acid composition enables simultaneous etching of aluminum, molybdenum, and ITO layers in one bath, merging what were previously distinct process steps. This maintains etching quality through controlled chemistry while dramatically improving productivity by eliminating sequential processing requirements
Solution Approach 2:
The universal etchant composition serves multiple functions by etching different materials with different rates and characteristics in a single process, maintaining etching quality across all materials while improving manufacturing efficiency through process consolidation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This etchant composition enables efficient and cost-effective simultaneous etching of conductive layers, improving productivity by allowing all conductive layers in a flat panel display device to be patterned using a single etchant, thereby simplifying the manufacturing process and reducing costs.
Implementation Method 1
an etchant composition capable of simultaneously etching aluminum, molybdenum and indium-tin-oxide
Implementation Method 2
the etching process is performed simultaneously on the gate electrode and the pixel electrode using the same etchant
Data Source
AI summary
An etchant composition, and methods of patterning a conductive layer and manufacturing a flat panel display device using the same are provided. The etchant composition may include phosphoric acid, nitric acid, acetic acid, water and an additive, wherein the additive includes a chlorine-based compound, a nitrate-based compound, and an oxidation regulator. In addition, the flat panel display device may be manufactured by patterning a gate electrode, source/drain electrodes and a pixel electrode using the same etchant composition. The gate electrode, source/drain electrodes and the pixel electrode may be formed of different conductive materials. Accordingly, processes are simplified so that manufacturing costs may be reduced and productivity may be improved.