Up-Conversion Phosphor Heat Treatment for Reproducible Particle Size
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Solution Overview
Problem
Existing processes for preparing up-conversion phosphors are impractical, time- and cost-intensive, and lack reproducibility, making them unsuitable for industrial-scale production, and often result in inhomogeneous particle size distribution and inadequate antimicrobial action.
Innovation Solution
A process involving the preparation of a mixture of lanthanoid salts, silicates, and fluxes, followed by thermal treatment at controlled heating and cooling ramps in thermal apparatuses such as muffle or rotary furnaces, ensuring uniform particle size and reproducible up-conversion phosphor production.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If existing processes for preparing up-conversion phosphors are used, then phosphor production is achieved, but the processes are impractical, time- and cost-intensive, and lack reproducibility
Solution Approach 1:
The patent applies parameter changes by optimizing the thermal treatment conditions including heating rate (10-100°C/min), holding temperature (900-1100°C), and cooling rate (10-100°C/min). These controlled parameter changes enable reproducible phosphor synthesis with consistent particle size distribution and crystal structure, making the process suitable for industrial-scale production while maintaining high reliability
2Manufacturing precision
If existing thermal treatment processes are used, then phosphor synthesis is achieved, but inhomogeneous particle size distribution results
Solution Approach 1:
The patent implements dynamics by using controlled heating and cooling rates (10-100°C/min) during thermal treatment. This dynamic temperature control, combined with optimized holding time (1-12 hours), ensures uniform nucleation and growth of phosphor particles, resulting in homogeneous particle size distribution while maintaining production efficiency through scalable furnace processes
3Productivity
If rapid production processes are implemented, then productivity increases, but apparatus wear increases and product quality may deteriorate
Solution Approach 1:
The patent optimizes the balance between productivity and product quality by establishing specific parameter ranges: heating rate (10-100°C/min), holding temperature (900-1100°C), and cooling rate (10-100°C/min). These controlled parameter changes enable relatively fast processing while maintaining consistent phosphor quality and minimizing apparatus wear through avoidance of extreme temperature shocks
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The process enables reproducible and efficient production of up-conversion phosphors with enhanced antimicrobial action, suitable for industrial applications, while minimizing apparatus wear and maintaining product quality.
Implementation Method 1
up-conversion phosphors with enhanced antimicrobial action
Implementation Method 2
thermal treatment at controlled heating and cooling ramps in thermal apparatuses
Implementation Method 3
thermal treatment at controlled heating and cooling ramps in thermal apparatuses such as muffle or rotary furnaces, ensuring uniform particle size
Implementation Method 4
UV radiation can be used in medicine or in hygiene, in order, for example, to disinfect water, gases or surfaces... UV-C radiation in the wavelength range between 200 nm and 280 nm
Implementation Method 5
up-conversion phosphors with enhanced antimicrobial action
Data Source
AI summary
A process can be used for the preparation of an up-conversion phosphor of the general formula (I):A1-x-y-zB*yB2SiO4:Ln1x,Ln2z, (I).The process involves preparing a mixture, introducing the mixture into a reaction chamber of a thermal apparatus, heating the mixture until a thermal treatment temperature is reached with a heating ramp, thermally treating the heated mixture for a holding time of at least 0.02 h, cooling the thermally treated material to room temperature while maintaining a cooling ramp, and obtaining a silicate-based lanthanoid ion-doped phosphor according to formula (I).
