Upper Electrode Lifting Mechanism for Plasma Processing
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Solution Overview
Problem
Conventional plasma processing apparatuses face difficulties in finely controlling the force of lifting the upper electrode, which limits precise manipulation and maintenance.
Innovation Solution
A plasma processing apparatus with a lifting mechanism comprising supporting members, connecting members, a rotation member, and a fixing member, where the rotation member engages with the connecting member to lift and fix the upper electrode to a cooling plate, allowing for adjustable torque control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a cam lock mechanism is used to attach the upper electrode to the receiving plate, then the electrode can be mechanically secured, but it becomes difficult to finely control the lifting force of the upper electrode
Solution Approach 1:
The invention replaces the static cam lock mechanism with a dynamic lifting mechanism that allows continuous adjustment of the lifting force. The lifting mechanism includes a lifting member that can be rotated to different positions, enabling fine control over the force applied to lift the upper electrode, thus resolving the contradiction between reliable attachment and precise force control.
Solution Approach 2:
The invention changes the control parameter from a fixed cam lock position to a variable lifting force that can be adjusted by rotating the lifting member. This allows the operator to change the lifting force parameter to achieve fine control, while the mechanism maintains reliable mechanical attachment through the engaged lifting structure.
2Temperature
If the upper electrode is tightly fixed to the cooling plate, then good thermal contact is achieved, but the electrode becomes difficult to exchange and maintain
Solution Approach 1:
The lifting mechanism provides a dynamic solution that allows the upper electrode to be easily detached by reversing the lifting action. The same mechanism used to apply downward pressure for thermal contact can be reversed to lift and remove the electrode, making maintenance simple while maintaining good thermal contact during operation.
Solution Approach 2:
The lifting mechanism is designed to apply preliminary downward pressure to ensure good thermal contact between the upper electrode and cooling plate before operation begins. This preliminary action of pressing the electrode into contact ensures optimal thermal coupling, while the reversible nature of the mechanism allows easy removal when maintenance is needed.
Data Source
AI summary
A plasma processing apparatus includes supporting members, connecting members, a rotation member and fixing members. Each of the supporting members is partially disposed in a disc-shaped cooling plate and configured to support an upper electrode provided below the cooling plate. Each of the connecting members is partially disposed in the cooling plate and extends in a diametrical direction of the cooling plate to be engaged with the corresponding supporting member. The rotation member is provided to surround an outer periphery of the cooling plate and has recesses formed to face the cooling plate and engaged with the corresponding connecting members. Each of the fixing members is configured to lift and fix the upper electrode to the cooling plate by applying a torque to the corresponding connecting member.