Upper Lid Gas Introduction Path for Substrate Processing Apparatus
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Solution Overview
Problem
Conventional substrate processing apparatuses require numerous parts for temperature control and have complex introduction tube configurations, increasing the number of components and complexity in preventing liquefaction of hydrogen fluoride gas, especially near the upper lid of the processing chamber.
Innovation Solution
The substrate processing apparatus integrates a gas introduction hole in the upper lid and a corresponding hole in the processing vessel, eliminating the need for a separate introduction tube by forming a direct introduction path when the lid engages the vessel, and includes temperature adjustment mechanisms for the lid and vessel to prevent gas liquefaction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a separate introduction tube is used to supply process gas into the processing chamber, then the gas supply path is established, but the number of parts increases and the configuration becomes complex
Solution Approach 1:
The patent merges the introduction tube function with the upper lid structure by forming gas introduction holes directly in the lid. The lid itself becomes the gas introduction component, eliminating the need for a separate detachable introduction tube while maintaining reliable gas supply to the processing chamber.
Solution Approach 2:
The upper lid is designed to serve multiple functions: it acts as both the chamber closure and the gas introduction component. The gas introduction holes in the lid integrate the gas supply function into the structural component, reducing the total number of parts required.
2Reliability
If temperature control is applied to the entire introduction tube including portions near the upper lid, then gas liquefaction is prevented, but the number of parts used for temperature control increases
Solution Approach 1:
The temperature control function is merged with the upper lid structure. Since the lid itself forms the gas introduction path, temperature control is applied directly to the lid rather than requiring separate heating elements for an introduction tube, reducing the number of temperature control parts.
Solution Approach 2:
The upper lid serves as both the structural closure and the temperature-controlled gas introduction component. By integrating these functions, the patent avoids requiring separate temperature control systems for dedicated introduction tubes.
3Ease of operation
If the introduction tube connected to the upper lid is made detachable to allow opening and closing, then the upper lid can be opened/closed, but extra parts are required and complexity increases
Solution Approach 1:
The gas introduction function is merged into the upper lid structure itself through gas introduction holes. This eliminates the need for a detachable introduction tube, allowing the lid to be opened and closed without complex connection mechanisms while maintaining gas supply capability when closed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design reduces the number of parts, simplifies temperature control, and prevents gas liquefaction, thereby enhancing operational efficiency and reducing the complexity of the apparatus.
Implementation Method 1
the temperatures of all members that form the introduction path through which the hydrogen fluoride gas is introduced into the chamber are controlled to prevent liquefaction of the hydrogen fluoride gas in the introduction path
Implementation Method 2
Dissociation of the hydrogen fluoride molecule clusters, which depends on the change in temperature and pressure, causes abrupt decrease in temperature, sometimes resulting in liquefaction of the hydrogen fluoride gas
Implementation Method 3
hydrogen fluoride gas boils at 19.5° C. (near room temperature) at atmospheric pressure (760 Torr), and liquefies at room temperature at or near atmospheric pressure
Data Source
AI summary
A substrate processing apparatus that can reduce the number of parts. A first gas introduction hole through which the hydrogen fluoride gas is introduced into a GDP is formed in an upper lid. A second gas introduction hole through which hydrogen fluoride gas is introduced from a hydrogen fluoride gas source is formed in a processing vessel. When the upper lid engages the upper portion of the processing vessel, one end of the first gas introduction hole is joined with one end of the second gas introduction hole to form an introduction path through which the hydrogen fluoride gas is introduced into a chamber.