Upstream Process Control Using Qualitative Analysis
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
State-of-the-art semiconductor manufacturing processes face challenges in making effective feed-forward adjustments due to quantitative analysis limitations, which can lead to inadequate compensation for errors and potential additional issues, resulting in reduced device performance and production yields.
Innovation Solution
A method and system that perform a qualitative analysis of upstream processes, using metrology measurements and workpiece features to evaluate characteristics, and select appropriate process control parameters or recipes for downstream processes, incorporating fuzzy logic, neural networks, or qualitative transfer functions to make informed adjustments.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If quantitative analysis is used for process control, then manufacturing precision is maintained through numerical measurements, but the ability to capture non-numerical factors and patterns is limited
Solution Approach 1:
The patent combines quantitative metrology measurements with qualitative visual inspection data into a unified process control system. The image processing module captures visual patterns and compares them against reference images, merging numerical measurement data with non-numerical visual information to comprehensively evaluate workpiece characteristics.
Solution Approach 2:
The patent introduces an image processing module as an intermediary between the workpiece and the control system. This module captures images, processes them to extract visual features, and converts them into comparable data that can be integrated with quantitative measurements, serving as a bridge between visual inspection and numerical analysis.
2Ease of operation
If feed-forward control adjustments are made based on quantitative data alone, then process control is simplified, but inadequate compensation for errors occurs
Solution Approach 1:
The patent implements a feedback mechanism where process characteristics are evaluated by comparing actual workpiece images against reference images stored in a database. This feedback loop identifies deviations and patterns, enabling more accurate feed-forward control adjustments that account for both quantitative measurements and qualitative visual variations.
Solution Approach 2:
The patent performs preliminary evaluation of process characteristics by comparing current workpiece images against reference images before making control adjustments. This preliminary action identifies potential issues and patterns early, allowing for more accurate feed-forward control parameter selection that prevents errors rather than merely compensating for them.
3Manufacturing precision
If multiple process parameters are monitored and adjusted, then downstream process outcomes improve, but system complexity increases
Solution Approach 1:
The patent segments the process control system into distinct functional modules: an image capture module, an image processing module, a reference image database, and a control parameter selection module. This segmentation allows each module to perform its specific function independently, managing complexity through modular design while maintaining comprehensive process monitoring and control.
Data Source
AI summary
A method, apparatus and a system, for performing a process control using analysis of an upstream process is provided. The method comprises performing a first process on a workpiece and performing a qualitative analysis upon the workpiece relating to the first process, the qualitative analysis comprises analyzing at least one metrology measurement relating to the first process and a workpiece feature to evaluate a characteristic of the workpiece. The method further comprises selecting a process control parameter for performing a second process upon the workpiece based upon the qualitative analysis.


