Upstream Valve Placement in Treatment Solution Supply Apparatus

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Solution Overview

Problem

In photolithography processes for semiconductor device manufacturing, existing treatment solution supply apparatuses face challenges in minimizing foreign substances, particularly fine particles, due to their generation at the opening/closing valve and inability to be removed by filters when the valve is positioned downstream.

Innovation Solution

A treatment solution supply apparatus is configured with a filter and a tubephragm pump, where the opening/closing valve is upstream of the filter, and a suck-back valve is downstream, controlled to stop solution sending and suspend discharge, ensuring foreign substances are removed by the filter.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If an opening/closing valve is provided downstream of the filter, then high cleanliness is ensured, but fine foreign substances are generated at the contact surface of the opening/closing member

Engineering Contradiction:
ImprovecleanlinessVSAvoidfine foreign substances
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The opening/closing valve is positioned upstream of the filter rather than downstream, so that the valve operation occurs before the treatment solution passes through the filter. This preliminary positioning allows the filter to capture fine foreign substances generated during valve operation, preventing them from reaching the treatment body.

Inventive Principle:
Principle #10Preliminary action

2Object-generated harmful factors

If the opening/closing valve is positioned upstream of the filter, then fine foreign substances generated by the valve can be removed by the filter, but the discharge timing control becomes more complex

Engineering Contradiction:
Improvefine foreign substances removalVSAvoidcontrol system complexity
Core Design Contradiction:
Object-generated harmful factorsVSDevice complexity

Solution Approach 1:

A suck-back valve is introduced as an intermediary component downstream of the filter to assist in controlling the discharge timing. The suck-back valve works in coordination with the opening/closing valve, allowing the upstream valve to focus on filtration while the downstream valve manages discharge timing, thereby distributing the control complexity across multiple specialized components.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Ease of operation

If a dispense valve with opening/closing mechanism is used, then discharge timing is adjusted and liquid draining property is improved, but fine foreign substances are generated

Engineering Contradiction:
Improvedischarge timing adjustmentVSAvoidfine foreign substances
Core Design Contradiction:
Ease of operationVSObject-generated harmful factors

Solution Approach 1:

The dispense valve function is segmented into two separate components: an opening/closing valve positioned upstream of the filter for timing control, and a suck-back valve positioned downstream for discharge suspension. This segmentation allows each component to perform its specific function while the filter effectively removes fine foreign substances generated during operation.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration effectively reduces foreign substances in the treatment solution, enhancing the cleanliness and reliability of the supply process, especially as semiconductor devices miniaturize.

Implementation Method 1

a filter configured to remove foreign substances in the treatment solution

Methodology Applied
Scientific EffectFiltration: Filter (physical)

Implementation Method 2

a tubephragm pump configured to send the treatment solution

Methodology Applied
Scientific EffectPumping: Pump

Data Source

PatentUS10807027B2Treatment solution supply apparatus and substrate treatment system
Publication Date: 2020.10.20 TOKYO ELECTRON LTD
  • US10807027B2 patent drawing
  • US10807027B2 patent drawing
  • US10807027B2 patent drawing

AI summary

A treatment solution supply apparatus to supply a treatment solution to a treatment solution discharge unit via a supply path that is provided with a filter configured to remove foreign substances in the treatment solution and a tubephragm pump to send the treatment solution, the supply path has an opening/closing valve on an upstream side of the tubephragm pump and the filter, and a suck-back valve on a downstream side of the tubephragm pump and the filter, and includes a control unit to control at least the tubephragm pump, the opening/closing valve, and the suck-back valve, wherein the control unit performs: a control of stopping sending of the treatment solution from the tubephragm pump; and a control of suspending discharge of the treatment solution from the treatment solution discharge unit by operation of the suck-back valve, and then closing the opening/closing valve to stop the discharge.