Upward Jet Treatment Basin for Uniform One-Sided Etching
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Solution Overview
Problem
Existing surface treatment methods, such as batch and inline processes, often suffer from heat build-up and oversaturation with reaction products, leading to reduced etching rates and suboptimal treatment quality, particularly when treating objects on one side.
Innovation Solution
A method and device where objects are transported through a basin with upwardly directed outlet openings for the treatment solution, ensuring fresh solution is constantly applied, avoiding heat build-up and oversaturation by removing reaction products and allowing for uniform one-sided treatment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If objects are immersed in a basin filled with treatment solution for batch treatment, then both sides of objects can be treated, but heat build-up and oversaturation with reaction products occur leading to reduced etching rate
Solution Approach 1:
The patent inverts the conventional downward jet direction by using upwardly directed outlet openings. Treatment solution is radiated upwards from below the transport plane, allowing fresh solution to contact the downward-facing surface of objects during transport. This inversion prevents heat build-up and oversaturation by continuously replacing spent solution with fresh solution, thereby maintaining high etching rates while ensuring treatment quality.
Solution Approach 2:
The patent transitions from static batch treatment to dynamic inline treatment. Objects are continuously transported through the basin while treatment solution jets are dynamically directed upwards to contact the downward-facing surface. This dynamic approach ensures continuous replenishment of fresh treatment solution, preventing heat build-up and maintaining consistent etching rates throughout the process.
2Quantity of substance
If treatment solution is emitted downwards towards the pool floor, then the basin can be filled with treatment solution, but heat build-up and oversaturation with reaction products in the area of objects cannot be avoided
Solution Approach 1:
Instead of emitting treatment solution downwards as in conventional designs, the patent uses upwardly directed outlet openings positioned below the transport plane. The treatment solution is radiated upwards to contact the downward-facing surface of objects during transport. This inversion ensures that fresh treatment solution is continuously supplied to the treatment zone, preventing heat build-up and oversaturation, thereby maintaining high treatment quality while utilizing the basin volume effectively.
3Productivity
If objects are treated using conventional inline processes with downward jets, then treatment can be performed during transport, but one-sided treatment quality is suboptimal due to heat build-up
Solution Approach 1:
The patent inverts the jet direction to radiate treatment solution upwards from below the transport plane. This allows the downward-facing surface of objects to be treated during transport with fresh solution continuously supplied from below. The inversion prevents heat build-up and oversaturation in the treatment zone, enabling high-quality one-sided treatment while maintaining high throughput characteristic of inline processes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach ensures a better quality of treatment results by maintaining the freshness of the treatment solution and preventing contamination, achieving homogeneous treatment and higher etching removal rates, up to 6 μm, on the downward-facing surface of objects.
Implementation Method 1
Treatment solution is radiated upwards by means of the upwardly directed outlet openings, forming jets of treatment solution
Implementation Method 2
the treatment solution introduced into the basin via the at least one feed device can remove heat and/or reaction products
Implementation Method 3
wet chemical etching processes are used to treat wafer surfaces
Data Source
Figure 1
Figure 2
Figure 3~4
AI summary
The present invention relates to a method for treating objects (2), in which objects (2) to be treated are transported through a tank (3) by means of a transporting device (5). Treatment solution (4) is introduced into the tank (3) by means of at least one feeding device (9), which is provided with upwardly directed outlet openings (13), and the treatment solution (4) is sprayed upwards by means of the upwardly directed outlet openings (13) to form jets of treatment solution (24); wherein the objects (2) are transported through the tank (3) over the upwardly directed outlet openings (13) and a downwardly facing surface (23) of the objects (2) is brought into contact with the jets of treatment solution (24) during the transport of the objects (2) through the tank (3). The invention also relates to a treatment apparatus (1) for carrying out such a method.