Utility Stage for Photolithographic Enclosure Maintenance

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Solution Overview

Problem

Current lithographic apparatuses face downtime and inefficiencies due to the need to open the enclosure for exchanging cleaning stones and performing maintenance tasks, which can take hours or even days, and there is a need for in-situ tool substitution to maintain tool availability and surface flatness during photolithographic processes.

Innovation Solution

An in-system utility stage is designed to transport and swap tools, such as cleaning stones, within the enclosure, allowing for the storage and retrieval of multiple tools from a tool store without opening the enclosure, enabling continuous operation by avoiding interference with wafer table motions and using extensible robotic arms for positioning and tool exchange.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of repair

If the enclosure is opened to exchange cleaning stones and perform maintenance tasks, then the maintenance can be performed, but the machine downtime increases significantly (hours or days)

Engineering Contradiction:
Improvemaintenance accessibilityVSAvoidmachine downtime
Core Design Contradiction:
Ease of repairVSLoss of time

Solution Approach 1:

The utility stage is extracted as a separate, movable component that can be positioned independently within the enclosure. This allows maintenance tools to be accessed and exchanged without opening the enclosure, as the utility stage can be moved to service positions while the main enclosure remains sealed and operational.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The utility stage acts as an intermediary carrier that holds maintenance tools (cleaning stones, etc.) and transports them to the wafer table. This intermediary system enables tool exchange and maintenance operations to occur within the enclosed space without requiring enclosure opening, thus preventing downtime.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Ease of operation

If multiple tools are stored outside the enclosure for easy access, then tool exchange is simplified, but the machine cannot operate continuously

Engineering Contradiction:
Improvetool exchange simplicityVSAvoidcontinuous operation capability
Core Design Contradiction:
Ease of operationVSProductivity

Solution Approach 1:

The tool storage capacity is nested within the utility stage structure itself. Multiple tools can be stored on the utility stage or in integrated storage compartments, allowing tool exchange to occur within the enclosed space without requiring external storage areas, thus maintaining continuous operation.

Inventive Principle:
Principle #7Nested doll (Nesting)

Solution Approach 2:

The utility stage provides a third spatial dimension for tool storage and exchange, separate from the wafer table plane. Tools can be stored vertically or in layered configurations on the utility stage, enabling easy access and exchange without interfering with the horizontal wafer processing operations.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Device complexity

If the utility stage interferes with wafer table motions, then the structure can be simpler, but the wafer processing is disrupted

Engineering Contradiction:
Improveutility stage structureVSAvoidwafer processing continuity
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The utility stage is designed with dynamic positioning capability, allowing it to move between parked positions (when not in use) and utility positions (when maintenance is needed). This dynamic behavior enables the utility stage to clear paths for wafer table motions when required, while still providing access for tool exchange and maintenance operations at specific positions.

Inventive Principle:
Principle #15Dynamics

Data Source

PatentUS20250021024A1Utility stage for photolithographic apparatus and method
Publication Date: 2025.01.16 ASML NETHERLANDS BV
  • US20250021024A1 patent drawing
  • US20250021024A1 patent drawing
  • US20250021024A1 patent drawing

AI summary

Disclosed is an apparatus for and method of using an in-system utility stage to provide service functions for wafer tables and other components in the photolithographic system in which the utility stage can access multiple tools without any need to open an enclosure containing the utility stage and the wafer tables and other components thus increasing throughput and decreasing downtime.