Integrated UV Drying Unit for Process Chamber Moisture Removal
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Solution Overview
Problem
Moisture and undesired gases from newly installed components in process chambers can lead to failures in substrate processing, reducing the reliability of integrated circuit and display devices, and increasing manufacturing costs due to the need for separate drying devices that lower throughput.
Innovation Solution
A drying unit with a light source, such as a UV-emitting device filled with heavy hydrogen gas, is integrated into the process chamber to rapidly and effectively remove moisture and gases from components, eliminating the need for a separate drying device by matching its shape and dimension to the substrate and using a control member to power and control the light source.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a separate drying device is used to remove moisture or undesired gases from newly installed components, then the reliability of the process chamber is improved, but the throughput is lowered and manufacturing cost increases
Solution Approach 1:
The patent combines the drying function with the process chamber by integrating a drying unit that includes a light source directly into the chamber. This merging eliminates the need for a separate drying device, allowing moisture removal to be performed within the same chamber that processes substrates, thereby maintaining throughput while ensuring reliability.
Solution Approach 2:
The process chamber is designed to serve multiple functions: it can process substrates and also perform drying operations on newly installed components. The drying unit integrated into the chamber enables the chamber to universally handle both manufacturing processes and moisture removal, eliminating the need for dedicated separate equipment.
2Reliability
If a separate drying device is used to remove moisture or undesired gases from newly installed components, then the reliability of the process chamber is improved, but the manufacturing cost increases
Solution Approach 1:
The patent combines the drying function with the process chamber by integrating a drying unit that includes a light source directly into the chamber. This merging eliminates the need for a separate drying device, allowing moisture removal to be performed within the same chamber that processes substrates, thereby maintaining throughput while ensuring reliability.
Solution Approach 2:
The process chamber is designed to serve multiple functions: it can process substrates and also perform drying operations on newly installed components. The drying unit integrated into the chamber enables the chamber to universally handle both manufacturing processes and moisture removal, eliminating the need for dedicated separate equipment.
3Ease of operation
If components are newly installed in the process chamber while exposed to external environment, then the ease of installation is improved, but moisture or undesired gases are discharged causing process failures
Solution Approach 1:
The patent applies preliminary action by performing drying on newly installed components before substrate processing begins. The drying unit is activated immediately after component installation to remove moisture and undesired gases in advance, preventing potential process failures and ensuring reliable operation.
Solution Approach 2:
The patent applies preliminary anti-action by using the drying unit to eliminate moisture and undesired gases from newly installed components before they can cause harmful effects during substrate processing. This preemptive removal of harmful substances prevents process failures and ensures reliable operation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution prevents process failures, enhances the reliability of integrated circuit and display devices, and improves throughput by efficiently removing moisture and gases without additional equipment, thereby reducing manufacturing costs.
Implementation Method 1
at least one light source for emitting a light
Implementation Method 2
The at least one light source may include a transparent container and a heavy hydrogen gas filled in the transparent container. For example, the transparent container may include a transparent ceramic selected from the group consisting of quartz, transparent alumina and transparent lead lanthanum zirconate titanate (PLZT). The at least one light source may emit an ultraviolet (UV) light having a wavelength of about 100 nm to about 400 nm.
Data Source
AI summary
An apparatus for processing a substrate may include a processing module including at least one process chamber for processing a desired process on a substrate, an index module for transferring the substrate from an outside into the processing module, and a drying unit for removing a moisture or undesired gases from the at least one process chamber. The drying unit may remove the moisture or the undesired gases from components newly installed in the at least one process chamber.