Ultraviolet Grid Lamp Cooling via Nitrogen Circulation
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Solution Overview
Problem
Existing ultraviolet (UVO) cleaning devices for semiconductor wafers are limited by slow processing times and mechanical issues such as heat generation, which can damage samples or slow down the cleaning process, especially in self-contained designs.
Innovation Solution
A self-contained UVO cleaning device with a high-intensity UV grid lamp and a quartz plate, utilizing a nitrogen circulating arrangement for cooling and a heated tray, which increases UV energy output while managing heat and maintaining a clean environment by recirculating nitrogen and balancing pressures between chambers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If high-intensity UV grid lamp is used to increase cleaning speed, then processing time is reduced, but heat generation increases which can damage samples
Solution Approach 1:
The device is divided into two separate chambers: a first chamber housing the UV grid lamp and a second chamber for sample placement. This segmentation isolates the heat-generating lamp from the sample, allowing high-intensity UV radiation to be delivered without directly exposing the sample to excessive heat that would cause damage.
Solution Approach 2:
A quartz plate is positioned between the UV grid lamp and the sample. The quartz plate transmits UV radiation effectively while providing thermal isolation, acting as an intermediary that allows the beneficial UV cleaning effect to reach the sample while blocking the harmful heat from the lamp.
2Productivity
If bigger and more powerful components are used to improve cleaning performance, then cleaning effectiveness is enhanced, but device size increases
Solution Approach 1:
The device utilizes a vertical arrangement with the UV grid lamp positioned above the sample chamber, separated by a quartz plate. This vertical dimensionality allows high-intensity UV radiation to be delivered effectively while maintaining a compact horizontal footprint, avoiding the need for larger horizontal spacing.
Solution Approach 2:
The UV grid lamp is positioned in close proximity (within five millimeters) to the sample through the quartz plate, concentrating the UV energy where it is needed most. This localized high-intensity approach achieves effective cleaning without requiring a larger overall device, as the energy is focused precisely on the sample area.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device achieves a significant reduction in processing time, up to 40% faster cleaning, while maintaining a clean and efficient operation, reducing the risk of heat damage and sample harm.
Implementation Method 1
The UVO method is a photo-sensitized oxidation process in which the contaminant molecules of photoresists, resins, human skin oils, cleaning solvent residues, silicone oils, and flux are excited and/or dissociated by the absorption of short-wavelength UV radiation
Implementation Method 2
a nitrogen circulating arrangement configured to circulate nitrogen along the ultraviolet grid lamp
Data Source
AI summary
An apparatus for cleaning a sample is provided. The apparatus includes an ultraviolet grid lamp having a forward side, the ultraviolet grid lamp configured to direct ultraviolet light energy from its forward side toward the sample, a quartz plate positioned between the forward side of the ultraviolet grid lamp and the sample, and a nitrogen circulating arrangement configured to circulate nitrogen along the ultraviolet grid lamp.