UV Laser Ablation of Ophthalmic Implants via Selective Absorption
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Solution Overview
Problem
Existing ablation processing systems for ophthalmic implant materials, particularly those using laser ablation, face challenges due to high water absorption and unintended tissue damage, especially with ArF excimer lasers, which require meticulous humidity control and surface drying, limiting their effectiveness and precision.
Innovation Solution
A device utilizing a pulsed laser beam with a wavelength between 200 nm and 250 nm, optimized for higher absorption in the implant material's base material than in water, combined with a scanner and humidity control system to maintain a predetermined air humidity, ensuring precise ablation processing without excessive water absorption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If ArF excimer lasers with wavelength 193nm are used for ablation processing, then deep penetration into tissue is avoided, but water absorption increases significantly requiring meticulous humidity control and surface drying
Solution Approach 1:
The patent changes the laser wavelength parameter from 193nm to the range 205nm-250nm, which reduces water absorption while maintaining sufficient absorption in protein-based implant material. This parameter change eliminates the need for complex humidity control and surface drying procedures
Solution Approach 2:
The patent converts the naturally higher water absorption at 193nm (which causes harmful effects) into a benefit by selecting a wavelength where water absorption is reduced but protein absorption remains high, thereby eliminating the need for cumbersome humidity control measures
2Device complexity
If laser wavelength is increased above 193nm to reduce water absorption, then humidity control requirements are reduced, but absorption in the implant material base material may decrease
Solution Approach 1:
The patent identifies and exploits the absorption spectrum characteristics of protein-based materials, selecting the wavelength range 205nm-250nm where protein absorption remains sufficiently high while water absorption decreases, achieving both goals simultaneously
Solution Approach 2:
The patent applies the principle of local quality by targeting specific absorption characteristics of the implant material's protein base material at the selected wavelength range, ensuring selective absorption that favors the implant material over water
3Productivity
If pulsed laser beams with high intensity are used for photoablation, then material removal efficiency increases, but unintended tissue damage may occur
Solution Approach 1:
The patent changes the wavelength parameter to 205nm-250nm, which provides optimal balance between absorption efficiency and selective targeting, enabling effective ablation with reduced risk of unintended thermal damage to surrounding tissue
Solution Approach 2:
The patent employs pulsed laser operation with carefully controlled pulse duration and repetition rate, allowing thermal diffusion to occur between pulses and preventing accumulation of excessive heat that could cause unintended tissue damage
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the precision and control of ablation processing by minimizing water absorption, reducing unintended tissue damage, and maintaining optimal humidity levels, thereby improving the accuracy and efficiency of ophthalmic implant material processing.
Implementation Method 1
a laser source which is set up to emit a pulsed laser beam with a processing wavelength in the ultraviolet wavelength range, the processing wavelength being greater than 193 nm and causing a higher degree of absorption of the laser beam in the base material of the implantation material than the degree of absorption of the laser beam in the water of the implantation material
Implementation Method 2
projection optics which are set up to radiate the pulsed laser beam onto a surface of the implantation material
Implementation Method 3
a scanner device which is set up to move the processing area for ablation processing according to a processing pattern
Data Source
Figure 1
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AI summary
A device (1) for ablation processing of ophthalmic implant material (2), which is formed from water-containing base material, comprises a laser source (11) which is configured to generate a pulsed laser beam (L) with a processing wavelength in the ultraviolet wavelength range, wherein the processing wavelength is greater than 193 nm and causes a higher absorption degree of the laser beam (L) in the base material of the implant material (2) than the absorption degree of the laser beam (L) in the water of the implant material (2).