UV Laser Photoreactor for High-Concentration Ozone Generation
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Solution Overview
Problem
Conventional methods for generating active oxygen species, such as DBD ozone generators and RF microwave-based systems, face challenges including hazardous liquid ozone handling, low efficiency, and oxidation of deposition process components, which complicates the deposition of oxide layers in semiconductor materials.
Innovation Solution
A system and method utilizing a photoreactor with an optical excitation source emitting ultraviolet radiation to excite molecular oxygen, forming atomic oxygen that reacts with molecular oxygen to produce ozone, eliminating the need for plasma generators and enabling continuous, on-demand generation of active oxygen species with higher concentrations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If DBD ozone generator is used to generate active oxygen species, then ozone can be formed, but the ozone concentration is only about 1% and further cryogenic distillation processing is required
Solution Approach 1:
The patent replaces the mechanical/electrical DBD system with a photonic system using UV laser excitation to generate atomic oxygen from molecular oxygen, which then reacts to form ozone. This substitution enables direct generation of high-concentration ozone (5-40%) without requiring cryogenic distillation equipment, thereby simplifying the overall process while improving ozone concentration
Solution Approach 2:
The patent changes the fundamental parameter of oxygen excitation from electrical discharge (DBD) to optical excitation (UV laser). This parameter change enables direct formation of atomic oxygen and subsequent ozone generation with concentrations of 5-40%, eliminating the need for further cryogenic processing and significantly simplifying the system
2Productivity
If RF microwave plasma is used to generate atomic oxygen, then atomic oxygen can be produced, but the efficiency is only about 1% to 5%
Solution Approach 1:
The patent substitutes the RF microwave plasma system with a UV laser photonic system for generating atomic oxygen. The UV laser directly excites molecular oxygen to form atomic oxygen through photodissociation, which then reacts with molecular oxygen to form ozone. This substitution dramatically improves the efficiency of active oxygen species generation and reduces energy waste
Solution Approach 2:
The patent changes the excitation method from RF microwave plasma to UV laser photonic excitation. This parameter change enables direct and efficient formation of atomic oxygen with high yield, subsequently reacting to form ozone at concentrations of 5-40%, thereby significantly improving productivity and reducing energy loss
3Reliability
If conventional plasma-based methods are used, then active oxygen species can be generated, but hazardous liquid ozone handling and oxidation of components are required
Solution Approach 1:
The patent replaces conventional plasma-based methods with a UV laser photonic system that generates atomic oxygen and ozone in a controlled manner. This substitution enables precise control over the generation process, producing ozone at concentrations of 5-40% without the need for hazardous liquid ozone handling, thereby improving process safety and reducing oxidation damage to system components
Solution Approach 2:
The patent changes the generation method from conventional plasma to UV laser photonic excitation, which provides precise control over the formation of active oxygen species. This parameter change enables the system to generate ozone at controlled concentrations of 5-40% in gas phase, eliminating the need for hazardous liquid ozone handling and reducing oxidation damage to components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for the reliable and efficient production of active oxygen species, achieving ozone concentrations of at least 5% to 40% in a continuous beam, reducing hazards and improving the efficiency and stability of oxide layer deposition processes.
Implementation Method 1
The radiation is configured to excite a proportion of the molecular oxygen in the reaction chamber, without the use of a plasma generator, to form atomic oxygen
Implementation Method 2
the atomic oxygen is able to react with the molecular oxygen in the reaction chamber to form ozone
Data Source
AI summary
Methods and systems are disclosed for generating an active oxygen species. A photoreactor has a reaction chamber, where an inlet to the reaction chamber is configured to be coupled to an oxygen source that contains molecular oxygen. An optical excitation source is optically coupled to the reaction chamber and is configured to generate radiation in an ultraviolet wavelength range. The radiation excites a proportion of the molecular oxygen in the reaction chamber, without the use of a plasma generator, to form atomic oxygen such that the atomic oxygen is able to react with the molecular oxygen in the reaction chamber to form ozone. An outlet from the reaction chamber is configured to emit a gas mixture comprising the atomic oxygen, the molecular oxygen, and the ozone.