UV Light Emitter for Substrate Exposure via Relative Motion
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Solution Overview
Problem
Conventional stepper systems for photolithographic exposure processing are complex and costly, making them unsuitable for achieving fine patterns on substrates with a simple configuration and low cost.
Innovation Solution
An exposure device with a holder, a light emitter, and a relative mover that moves at least one of the holder and the light emitter to irradiate the substrate's surface with light, eliminating the need for a complicated optical mechanism and allowing for exposure of a photosensitive film with a simple configuration and low cost.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional stepper is used for exposure processing, then fine patterns can be achieved on substrates, but the configuration becomes complicated and cost increases
Solution Approach 1:
The exposure device is divided into independent functional modules: a substrate holder for positioning, a light emitter for UV irradiation, and a relative mover for precise positioning. This segmentation allows each component to be optimized independently, achieving fine pattern exposure without the need for a complex integrated stepper system.
Solution Approach 2:
The patent replaces the complex optical-mechanical system of a conventional stepper with a simpler system combining UV light emission and mechanical positioning. The light emitter uses UV LEDs or lasers instead of complex optical lenses and mirrors, while the relative mover provides precise positioning through mechanical means, thereby simplifying the overall configuration while maintaining exposure precision.
2Manufacturing precision
If a conventional stepper is used for exposure processing, then fine patterns can be achieved on substrates, but manufacturing cost increases
Solution Approach 1:
The patent employs inexpensive light sources such as UV LEDs or lasers that can be easily replaced, and uses a simple mechanical positioning system instead of expensive precision steppers. The holder and light emitter are designed as cost-effective components that can be manufactured using standard processes, significantly reducing the overall manufacturing cost while maintaining sufficient exposure precision for fine patterns.
Solution Approach 2:
The patent changes the exposure parameters by using UV wavelength light sources with specific emission characteristics. By optimizing the UV wavelength and exposure duration, the system achieves fine pattern formation without requiring the high-precision mechanical scanning of conventional steppers, thereby reducing manufacturing cost while maintaining pattern fineness.
3Productivity
If the substrate is moved between first and second positions for exposure, then throughput is improved, but the system requires coordinated movement control
Solution Approach 1:
The patent combines the substrate holding function and the movement function into an integrated holder assembly. The relative mover simultaneously controls both the substrate position and the light emitter position, merging multiple control functions into a single coordinated system. This reduces the overall system complexity while enabling continuous substrate processing and improving throughput.
Solution Approach 2:
The patent implements continuous exposure processing by moving the substrate through the exposure zone without stopping. The relative mover maintains continuous relative motion between the substrate and light emitter, ensuring uninterrupted UV irradiation. This continuous action eliminates idle time between processing steps, thereby improving substrate throughput while the single mover system keeps control complexity manageable.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables efficient exposure of photosensitive films on substrates with a simple setup, improving throughput and reducing manufacturing costs by eliminating the need for complex optical systems, while allowing for simultaneous temperature processing and sequential processing steps.
Implementation Method 1
a light emitter that emits light for modifying the photosensitive film
Implementation Method 2
a relative mover that is configured to move at least one of the holder and the light emitter relative to the other such that the one surface of the substrate held by the holder is irradiated with the light emitted by the light emitter
Data Source
AI summary
In an entire region exposure unit, a platform section and a local transfer mechanism are arranged in one direction. The local transfer mechanism is provided with a local transfer hand. A substrate on which a resist film having a predetermined pattern is formed is held by the local transfer hand. A light-emitting device is attached to the upper portion of the local transfer mechanism. Strip-shaped light is emitted from the light-emitting device toward below. The local transfer mechanism operates such that the local transfer hand is moved relative to the light-emitting device. At this time, the light-emitting device irradiates one surface of the substrate that is moving horizontally with the strip-shaped light. The resist film is modified by the light.