UV Light Source Radial Arrangement for Uniform Oxide Film Formation

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Solution Overview

Problem

Existing substrate processing technologies face challenges in achieving uniform oxide film formation while increasing the formation rate, as increasing the output of ultraviolet light sources can impair in-plane uniformity of film quality.

Innovation Solution

A substrate processing apparatus with three ultraviolet light sources, each offset from the rotation axis and arranged in a specific positional relationship (L1 < L3 < L2), ensures equal irradiation intensities and outputs, maintaining uniformity while allowing for increased oxide film formation rates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the output of ultraviolet light sources is increased to enhance oxide film formation rate, then productivity is improved, but manufacturing precision deteriorates due to impaired in-plane uniformity of film quality

Engineering Contradiction:
Improveoxide film formation rateVSAvoidin-plane uniformity of film quality
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The ultraviolet irradiation system is segmented into three separate light sources positioned at different radial distances from the rotation axis. This segmentation allows each light source to contribute differently to the overall irradiation pattern, enabling high total output while maintaining uniform distribution across the substrate surface.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The three ultraviolet light sources are positioned asymmetrically at different distances from the rotation axis rather than symmetrically. This asymmetric arrangement, with specific radial positioning, creates a balanced irradiation pattern that maintains in-plane uniformity despite the unequal individual positions, resolving the contradiction between high output and uniformity.

Inventive Principle:
Principle #4Asymmetry

2Manufacturing precision

If multiple ultraviolet light sources are used to maintain uniformity, then manufacturing precision is improved, but device complexity increases

Engineering Contradiction:
Improvein-plane uniformity of film qualityVSAvoidnumber of ultraviolet light sources
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

Each ultraviolet light source is positioned at a specific local position with a particular distance from the rotation axis, creating localized irradiation zones that collectively achieve global uniformity. The third light source is specifically positioned to fill irradiation gaps and balance the overall distribution, demonstrating local quality optimization for global uniformity.

Inventive Principle:
Principle #3Local quality

3Manufacturing precision

If ultraviolet light sources are positioned closer to the rotation axis to improve central uniformity, then manufacturing precision is improved, but productivity decreases due to reduced overall irradiation intensity

Engineering Contradiction:
Improvecentral region uniformityVSAvoidoverall irradiation intensity
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The problem of uniformity vs. intensity is solved by transitioning from a single-dimension approach (one light source position) to a multi-dimensional approach (three light sources at different radial positions). This dimensional expansion in the radial direction allows simultaneous optimization of both central uniformity and overall irradiation intensity by distributing sources across different radial zones.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration allows for enhanced oxide film formation rates while maintaining in-plane uniformity of film quality, such as film thickness, by ensuring consistent ultraviolet irradiation across the substrate.

Implementation Method 1

at least three ultraviolet light sources...configured to irradiate the processing gas inside the processing container with ultraviolet rays

Methodology Applied
Scientific EffectUltraviolet irradiation: Photo-oxidation

Data Source

PatentUS11527404B2Substrate processing apparatus and substrate processing method
Publication Date: 2022.12.13 TOKYO ELECTRON LTD
  • US11527404B2 patent drawing
  • US11527404B2 patent drawing
  • US11527404B2 patent drawing

AI summary

An apparatus includes: a processing container; a stage provided inside the processing container to place a substrate thereon; a gas supply mechanism for supplying a processing gas into the processing container; and at least three ultraviolet light sources provided to irradiate the processing gas inside the processing container with ultraviolet rays. The ultraviolet light sources are provided to be offset from a rotation axis of the stage in a plan view, and are arranged in a light source arrangement direction with distances from the ultraviolet light sources to the rotation axis being different from one another. The ultraviolet light sources include first to third ultraviolet light source. The third ultraviolet light source is arranged such that distances L1, L2, and L3 from the first to third ultraviolet light sources, respectively, to the rotation axis in a plan view satisfies a relationship of L1&lt;L3&lt;L2.