Ultraviolet Neutralization of Electrified Processing Liquid in Substrate Nozzles

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Solution Overview

Problem

The electrification of processing liquids in substrate processing systems leads to contamination of substrates by peripheral particles and arcing due to static electricity, which affects the manufacturing of semiconductors and displays.

Innovation Solution

A substrate processing apparatus that includes a light source unit emitting ultraviolet rays to eliminate electricity from the processing liquid, which is supplied through a nozzle unit and a processing liquid supply tube made of insulating material, ensuring the ultraviolet rays are directed at the processing liquid before or as it is discharged onto the substrate to prevent contamination and arcing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the processing liquid flows through the insulating supply tube, then the processing liquid becomes electrified, but this causes substrate contamination by charged particles and arcing due to static electricity

Engineering Contradiction:
Improveprocessing qualityVSAvoidsubstrate contamination and arcing
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent applies preliminary action by introducing the light source unit to irradiate the processing liquid with light before the liquid reaches the substrate. This pre-treatment eliminates static electricity from the processing liquid in advance, preventing the harmful effects of charged particles and arcing on the substrate.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent uses light as an intermediary substance to transfer energy to the processing liquid. The light source unit acts as a mediator that interacts with the electrified processing liquid, eliminating its electrical charge through photonic interaction without directly contacting the liquid or substrate.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Object-affected harmful factors

If a light source unit is added to eliminate electricity from the processing liquid, then substrate contamination and arcing are prevented, but the device complexity increases

Engineering Contradiction:
Improvesubstrate contamination and arcingVSAvoidapparatus structure
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The light source unit serves multiple functions: it eliminates static electricity from the processing liquid, prevents substrate contamination, and prevents arcing. This multi-functionality justifies the added complexity by addressing multiple harmful effects simultaneously with a single integrated component.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The ultraviolet irradiation effectively neutralizes the electrical charge in the processing liquid, minimizing contamination and arcing, thereby improving the processing quality and preventing damage to substrates during semiconductor and display manufacturing.

Implementation Method 1

a light source unit which is supplied with electricity from the outside and emits ultraviolet rays in a direction toward the processing liquid

Methodology Applied
Scientific EffectUltraviolet radiation: Light

Implementation Method 2

the processing liquid, which is electrified while passing through the processing liquid supply tube, is irradiated with ultraviolet rays, thereby electricity may be eliminated from the electrified processing liquid

Methodology Applied
Scientific EffectPhotoelectric effect: Photoelectric Effect

Data Source

PatentUS10964557B2Substrate processing apparatus and substrate processing method
Publication Date: 2021.03.30 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US10964557B2 patent drawing
  • US10964557B2 patent drawing
  • US10964557B2 patent drawing

AI summary

The present disclosure relates to a substrate processing apparatus and a substrate processing method. The substrate processing apparatus according to the exemplary embodiment of the present disclosure may include: a processing liquid supply tube; a nozzle unit which is supplied with a processing liquid from the processing liquid supply tube and discharges the processing liquid to the substrate; and a light source unit which is provided to irradiate the processing liquid discharged from the nozzle unit with ultraviolet rays. According to the present disclosure, the processing liquid, which is electrified while passing the processing liquid supply tube, is irradiated with ultraviolet rays, such that electricity is eliminated from the electrified processing liquid, and as a result, it is possible to minimize a problem that the substrate is contaminated by peripheral particles or arcing occurs on the substrate.