Ultrapure Water UV Oxidation Catalyst Control
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Solution Overview
Problem
Conventional ultrapure water manufacturing systems face challenges in minimizing hydrogen peroxide generation and its adverse effects, leading to increased dissolved oxygen and organic material concentrations, which degrade downstream apparatuses and hinder the production of high-purity water.
Innovation Solution
The system employs a method with controlled ultraviolet radiation intensity in secondary and tertiary pure water manufacturing apparatuses, combined with hydrogen peroxide decomposition catalysts to minimize hydrogen peroxide generation and concentration, and includes deoxidation steps to reduce dissolved oxygen, optimizing the radiation intensity to balance TOC decomposition and hydrogen peroxide generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If ultraviolet oxidation is applied to decompose organic materials (TOC components), then TOC concentration is reduced, but hydrogen peroxide is generated and dissolved oxygen concentration increases
Solution Approach 1:
The patent applies this principle by introducing a hydrogen peroxide decomposition catalyst that converts the harmful hydrogen peroxide byproduct into beneficial components. The catalyst decomposes H2O2 into water and oxygen, eliminating its harmful effects while the generated oxygen can be utilized in the oxidation process, thus transforming a harmful factor into a beneficial one
Solution Approach 2:
The patent introduces a hydrogen peroxide decomposition catalyst as an intermediary substance between the ultraviolet oxidation process and the downstream pure water manufacturing apparatus. This catalyst acts as a mediator that removes hydrogen peroxide from the water stream, preventing it from reaching and damaging downstream equipment while allowing the oxidation process to continue effectively
2Productivity
If ultraviolet radiation intensity is increased to enhance TOC decomposition, then oxidation efficiency improves, but hydrogen peroxide generation increases
Solution Approach 1:
The patent implements feedback control by monitoring the balance between TOC decomposition efficiency and hydrogen peroxide generation. The system adjusts operational parameters based on the observed effects, and the presence of the hydrogen peroxide decomposition catalyst provides continuous removal of H2O2, creating a feedback mechanism that allows sustained high-intensity UV irradiation without harmful accumulation of hydrogen peroxide
Solution Approach 2:
By introducing the hydrogen peroxide decomposition catalyst, the system converts the harmful effect of excessive hydrogen peroxide generation into a benefit. The catalyst ensures that even at high UV intensities, hydrogen peroxide is continuously decomposed, allowing the system to operate at optimal oxidation efficiency without suffering from the harmful effects of H2O2 accumulation
3Reliability
If hydrogen peroxide is not removed, then downstream apparatuses are degraded, but additional removal steps increase system complexity
Solution Approach 1:
The patent merges the hydrogen peroxide decomposition function with the existing pure water manufacturing system by introducing a catalyst that can be integrated into the current apparatus configuration. The catalyst is placed within the existing flow path, combining the oxidation and decomposition functions in a unified system rather than adding separate complex removal steps
Solution Approach 2:
The hydrogen peroxide decomposition catalyst operates autonomously within the water stream, continuously decomposing hydrogen peroxide as water passes through the system. This self-service mechanism eliminates the need for complex external removal systems, operational interventions, or additional processing steps, thereby maintaining system simplicity while ensuring downstream apparatus protection
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively suppresses hydrogen peroxide influx into downstream apparatuses, achieving high-purity ultrapure water with reduced TOC and DO concentrations, while also optimizing energy consumption by adjusting ultraviolet radiation intensity.
Implementation Method 1
oxidizing and decomposing organic materials (TOC components) in the water with ultraviolet rays
Implementation Method 2
removing the oxidative decomposition products through ion exchange
Implementation Method 3
a deaeration apparatus; Entrained dissolved gases, e.g., DO (dissolved oxygen), are removed
Implementation Method 4
an ultrafiltration (UF) membrane separation apparatus or a microfiltration (MF) membrane separation apparatus
Data Source
AI summary
In production of ultrapure water by purifying primary pure water with a secondary pure water manufacturing apparatus and a tertiary pure water manufacturing apparatus, high-purity ultrapure water is produced, wherein generation of hydrogen peroxide is minimized and the concentrations of TOC, DO, and hydrogen peroxide are reduced to the limit. In an ultrapure water manufacturing system, each of the secondary pure water manufacturing apparatus and the tertiary pure water manufacturing apparatus includes an ultraviolet oxidation device and a deionization device, downstream therefrom, by using an ion exchange resin. UV light control is performed in such a way that the hydrogen peroxide concentration results in 1 to 30 μg/L and the TOC concentration results in 1 to 10 μg/L at the outlet of the ultraviolet oxidation apparatus of the secondary pure water manufacturing apparatus and, in addition, the TOC concentration results in 0.1 to 5 μg/L at the outlet of the ultraviolet oxidation apparatus of the tertiary pure water manufacturing apparatus. UV light control is performed in such a way that the TOC concentration results in 1 to 10 μg/L at the outlet of the ultraviolet oxidation apparatus of the secondary pure water manufacturing apparatus and, in addition, the hydrogen peroxide concentration results in 1 to 20 μg/L and the TOC concentration results in 0.1 to 5 μg/L at the outlet of the ultraviolet oxidation apparatus of the tertiary pure water manufacturing apparatus.