UV-Ozone Water Cleaning Layout That Shields Substrates From UV
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Solution Overview
Problem
Ultraviolet ozonated water cleaning devices inadvertently remove or alter additional materials on semiconductor substrates during cleaning, leading to defects due to direct exposure to ultraviolet radiation.
Innovation Solution
A cleaning apparatus and method that includes a lamp emitting ultraviolet radiation, a housing with a cooling chamber, a water deflector for ozonated water, and reflectors to shield the substrate from UV radiation, allowing for controlled irradiation of ozonated water while preventing direct UV exposure to the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the substrate is exposed to ultraviolet radiation during cleaning, then contaminants are removed, but additional materials are undesirably removed or altered causing defects
Solution Approach 1:
The cleaning system is divided into separate functional zones: an irradiation region where UV radiation cleans contaminants, and a substrate processing region where the substrate is protected. The water deflector and reflectors create distinct spatial separation between the harmful UV radiation path and the substrate location.
Solution Approach 2:
Ozonated water serves as an intermediary medium that absorbs UV radiation and transfers cleaning action to the substrate indirectly. The irradiated ozonated water flows onto the substrate, delivering cleaning benefits without direct UV exposure. The lower reflector also acts as an intermediary barrier to block UV radiation from reaching the substrate.
2Manufacturing precision
If a lamp emits ultraviolet radiation for cleaning, then contaminants are removed, but the lamp generates heat requiring cooling
Solution Approach 1:
The cooling chamber is nested within the housing structure, surrounding the lamp. This nested configuration allows efficient heat dissipation from the lamp while maintaining a compact overall device structure. The cooling chamber is positioned to directly contact or closely surround the lamp for effective thermal management.
3Object-affected harmful factors
If reflectors are added to shield the substrate from UV radiation, then substrate defects are reduced, but device complexity increases
Solution Approach 1:
The housing structure serves multiple functions: it houses the lamp, provides structural support, and incorporates the cooling chamber. The water deflector also serves dual purposes: directing water flow and acting as a physical barrier. These multi-functional elements reduce the need for additional separate components for UV shielding.
Solution Approach 2:
The reflectors, while adding structural elements, convert potentially harmful scattered UV radiation into beneficial directed radiation toward the water flow path. The lower reflector blocks harmful UV from reaching the substrate while the upper reflector enhances cleaning efficiency by directing UV radiation onto the ozonated water.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively removes contaminants from substrates without causing additional material removal or alteration, thereby reducing defects and improving cleaning precision.
Implementation Method 1
a lamp configured to emit ultraviolet radiation in an irradiation region
Implementation Method 2
the upper reflector and the lower reflector are configured to at least partially define the irradiation region and to reflect ultraviolet radiation emitted by the lamp toward the water flow path
Implementation Method 3
wherein the lower reflector is configured to shield the substrate from ultraviolet radiation emitted by the lamp
Implementation Method 4
a housing that houses the lamp, the housing defining a cooling chamber surrounding the lamp
Data Source
AI summary
A cleaning apparatus for cleaning a substrate includes a lamp for emitting ultraviolet radiation in an irradiation region; a housing that houses the lamp; a water deflector spaced below the housing, the water deflector having a water inlet for receiving a supply of ozonated water and a water outlet for discharging ozonated water irradiated by the lamp into a substrate processing region beneath the water deflector, and defining a water flow path between the water inlet and the water outlet, the water flow path extending in the irradiation region; an upper reflector extending along and above the lamp; and a lower reflector extending along and below the water deflector, wherein the upper reflector and the lower reflector at least partially define the irradiation region and reflect ultraviolet radiation toward the water flow path, and wherein the lower reflector shields the substrate from ultraviolet radiation emitted by the lamp.