UV Transparent Showerhead for Integrated Chemical and UV Processing
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Solution Overview
Problem
The existing process for restoring low-k films in semiconductor devices requires two separate chambers for chemical and UV treatments, leading to increased costs and time due to incompatibility of halogen and ozone with traditional UV chambers.
Innovation Solution
A processing chamber that integrates UV transparent gas distribution showerheads and windows, allowing for both chemical treatment and UV curing in the same chamber, with a UV unit directing UV energy through the showerhead and window, enabling fluid communication for simultaneous processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If two separate chambers are used for chemical treatment and UV curing, then compatibility between processing gases and UV window materials is improved, but device complexity and processing time increase
Solution Approach 1:
The patent merges the chemical treatment chamber and UV curing chamber into a single integrated processing chamber. The showerhead is designed with UV-transparent materials (such as quartz) that allow UV light to pass through while withstanding exposure to halogen and ozone gases. This integration eliminates the need for separate chambers and substrate transfer, resolving the contradiction between compatibility and device complexity.
Solution Approach 2:
The processing chamber is designed to perform multiple functions: chemical treatment with halogen/ozone gases and UV curing, within the same chamber. The showerhead structure serves dual purposes as both a gas distribution component and a UV-transparent window, enabling the chamber to handle both plasma-based chemical processes and UV-based curing processes without requiring separate dedicated chambers.
2Reliability
If two separate chambers are used for chemical treatment and UV curing, then material compatibility is improved, but productivity decreases due to additional substrate transfer time
Solution Approach 1:
By combining chemical treatment and UV curing in one chamber, the patent eliminates the substrate transfer step between chambers. The integrated design allows continuous processing where substrates undergo chemical treatment followed immediately by UV curing without removal or transfer, thereby improving productivity while maintaining material compatibility through careful selection of UV-transparent materials that resist chemical degradation.
3Power
If a traditional UV chamber with quartz window is used, then UV curing effectiveness is improved, but compatibility with halogen and ozone gases deteriorates
Solution Approach 1:
The showerhead is designed with localized UV-transparent properties at the regions where UV light must pass through, while other portions can be made of materials optimized for chemical resistance. The structure incorporates UV-transparent materials (quartz, sapphire, or specific coatings) precisely where needed for UV transmission, while maintaining overall chemical compatibility with halogen and ozone gases through material selection and protective coatings.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This integrated approach reduces costs and time by eliminating the need for separate chambers, enhancing efficiency and productivity while maintaining compatibility with halogen and ozone-based processing gases.
Implementation Method 1
curing the substrate by directing a UV energy towards the substrate from the UV unit through the UV transparent gas distribution showerhead and the UV transparent window
Implementation Method 2
chemically treating the substrate by flowing one or more processing gas through the UV transparent gas distribution showerhead from a gas volume defined between the UV transparent window and the UV transparent gas distribution showerhead
Data Source
AI summary
Embodiments of the present invention provide apparatus and methods for performing UV treatment and chemical treatment and/or deposition in the same chamber. One embodiment of the present invention provides a processing chamber including a UV transparent gas distribution showerhead disposed above a substrate support located in an inner volume of the processing chamber, a UV transparent window disposed above the UV transparent gas distribution showerhead, and a UV unit disposed outside the inner volume. The UV unit is configured to direct UV lights towards the substrate support through the UV transparent window and the UV transparent gas distribution showerhead.