Vacant Baffle Ion Injecting Device for Particle Isolation
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Solution Overview
Problem
Existing ion injecting devices suffer from excessive suspending particles in the process chamber, which shield the ion beam and result in poor dark and bright characteristic dots on OLED displays, due to the lack of effective isolation between the process chamber and the analyzing magnet, leading to abnormal ion injection and electrical failures.
Innovation Solution
Incorporating a vacant baffle between the process chamber and the analyzing magnet to isolate them during non-injection periods, along with dual Faraday cups for real-time current density detection to monitor and address excessive particles, and adjusting vacuum levels to prevent contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the process chamber and analyzing magnet are continuously connected, then ion injection can be performed without interruption, but suspending particles accumulate in the process chamber shielding the ion beam
Solution Approach 1:
The patent divides the chamber system into two isolated sections: the process chamber and the analyzing magnet chamber, separated by a baffle. This segmentation allows independent vacuum maintenance in each chamber, preventing particle accumulation in the process chamber while enabling continuous ion injection operations.
Solution Approach 2:
The patent introduces a baffle as an intermediary component between the process chamber and analyzing magnet chamber. This baffle acts as a physical barrier that blocks particle migration while allowing controlled ion beam passage, thus protecting the process chamber from particle contamination during continuous operation.
2Object-affected harmful factors
If the process chamber is isolated from the analyzing magnet, then particle accumulation is prevented, but ion injection operations must be interrupted
Solution Approach 1:
The patent employs a dynamically adjustable baffle that can move between different positions. During ion injection, the baffle opens to allow ion beam passage; during non-injection periods, it closes to isolate the chambers. This dynamic adjustment enables the system to switch between operational modes without permanent structural changes or lengthy reconfiguration.
Solution Approach 2:
The patent implements periodic opening and closing of the baffle synchronized with ion injection cycles. The baffle opens periodically during injection operations and closes during idle periods, creating a rhythmic pattern of connection and isolation that maintains particle-free conditions while enabling continuous production cycles.
3Object-affected harmful factors
If vacuum levels are increased to reduce particles, then particle shielding is reduced, but vacuum maintenance becomes more difficult and time-consuming
Solution Approach 1:
The patent segments the vacuum system into two independent vacuum chambers separated by a baffle. Each chamber can be evacuated and maintained at its required vacuum level independently, allowing the process chamber to achieve high vacuum for particle reduction without requiring the entire system to be maintained at that level, thus simplifying overall vacuum maintenance.
Solution Approach 2:
The baffle acts as an intermediary that isolates the high-vacuum process chamber from the lower-vacuum analyzing magnet chamber. This isolation allows the process chamber to maintain high vacuum levels for particle reduction while the analyzing magnet chamber can operate at lower vacuum levels, reducing the overall complexity and time required for vacuum maintenance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution significantly reduces the number of suspending particles in the process chamber, improving ion injection uniformity, extending cleaning intervals, and reducing the likelihood of dark and bright characteristic dots, while maintaining a stable vacuum environment and shortening device downtime.
Implementation Method 1
an analyzing magnet connected with the process chamber through a beam flow chamber
Implementation Method 2
the first Faraday cup is located on the surface of the vacant baffle facing the analyzing magnet; and the second Faraday cup is located on the surface of the process chamber facing the analyzing magnet
Data Source
AI summary
The disclosure discloses an ion injecting device, and an ion injecting method thereof, where the ion injecting device is modified by adding a vacant baffle between a process chamber and an analyzing magnet. Moreover the vacant baffle is closed before an engineer opens the process chamber for cleaning, so that the process chamber is separated from the analyzing magnet, thus maintaining a vacuum environment in the analyzing magnet. Subsequently only a vacuum environment in the process chamber will be created again.