Vacuum Baking and Hydrophobic Coating for Substrate Component Defect Prevention
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Defects such as particles and metal contaminants on components of substrate processing chambers interfere with substrate processing, caused by residual water and contaminants that adhere to surfaces during fabrication and cleaning, leading to degraded performance and results.
Innovation Solution
A method involving vacuum baking and purging to remove surface water and contaminants, followed by applying a hydrophobic protective coating like silane to prevent re-absorption of water, is used to minimize defects on components before installation in the processing chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If components are cleaned and dried during fabrication, then water and contaminants are removed from surfaces, but residual water and contaminants still adhere to surfaces leading to defects
Solution Approach 1:
The patent applies parameter changes by heating components to elevated temperatures (e.g., 100°C to 200°C) in a vacuum environment, transforming the physical state of residual water from liquid to vapor for removal, and modifying surface energy characteristics to prevent contaminant adhesion
Solution Approach 2:
The patent uses vacuum environment and inert gases (nitrogen, argon) to create an inert atmosphere that prevents oxidation and contaminant adhesion to component surfaces during processing and storage, eliminating harmful interactions with reactive atmospheric components
2Ease of operation
If components are stored in ambient environment after cleaning, then they are readily available for installation, but they re-absorb water and contaminants from the environment
Solution Approach 1:
The patent stores components in vacuum chambers or containers filled with inert gases, creating an environment that prevents water and contaminant absorption while maintaining readiness for installation, thus preserving both reliability and operational convenience
Solution Approach 2:
The patent applies self-service through hydrophobic coatings that automatically repel water and contaminants upon contact, providing continuous protection without requiring active maintenance or monitoring, ensuring components remain defect-free from storage through installation
3Reliability
If hydrophobic coating is applied to component surfaces, then water and contaminants are prevented from adhering, but additional processing steps and time are required
Solution Approach 1:
The patent applies hydrophobic coatings during component fabrication or immediately before installation in a vacuum environment, performing the protective action in advance so that components are ready for immediate use without requiring additional processing time later, thus eliminating the time penalty while maintaining defect prevention
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively reduces the attachment of defects and metal contaminants, enhancing the startup performance and processing results by maintaining a clean and dry environment within the processing chamber.
Implementation Method 1
baking the component at a baking temperature during a first predetermined period to remove water and defects from the surfaces of the component
Implementation Method 2
applying a hydrophobic protective coating like silane to prevent re-absorption of water
Data Source
AI summary
A method for removing and preventing defects on surfaces of a component of a substrate processing chamber includes loading the component into a vacuum chamber and, with the component loaded within the vacuum chamber, baking the component at a baking temperature during a first predetermined period to remove water and defects from the surfaces of the component, and purging the component within the vacuum chamber during at least one second predetermined period to remove the defects from the vacuum chamber.