Vacuum Chamber Leak Detection via Residual Gas Analyzer
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Solution Overview
Problem
Current methods for vacuum chamber leak detection in semiconductor fabrication are time-consuming, inefficient, and lack sensitivity, particularly when using rate-of-rise testing and residual gas analyzers (RGAs), which can fail to detect leaks in nitritation chambers or require extensive equipment setups.
Innovation Solution
A method and system that utilize a host vacuum chamber and a guest vacuum chamber, where the host chamber's atmosphere is measured initially and then mixed with the guest chamber's atmosphere using a residual gas analyzer (RGA), allowing for the automatic determination of the guest chamber's composition, reducing the need for multiple RGAs and improving sensitivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If rate-of-rise (ROR) testing is used for vacuum chamber leak detection, then the testing process is simple to perform, but the detection sensitivity is insufficient and time-consuming
Solution Approach 1:
The patent introduces a residual gas analyzer (RGA) as an intermediary device between the vacuum chamber and the detection system. The RGA provides mass spectrometry analysis of gases in the chamber, enabling sensitive detection of leaks while maintaining operational simplicity through automated measurement protocols
2Measurement precision
If multiple residual gas analyzers (RGAs) are installed on each process chamber to replace ROR testing, then leak detection sensitivity is improved, but device complexity and equipment cost increase significantly
Solution Approach 1:
The patent makes the residual gas analyzer universal by enabling it to measure multiple process chambers sequentially through automated valve control. A single RGA performs the function of multiple RGAs by isolating and measuring different chambers in sequence, thereby reducing equipment complexity while maintaining high detection sensitivity
Solution Approach 2:
The system implements periodic measurement cycles where the RGA sequentially measures different process chambers. The automated valve system periodically switches between chambers, allowing one RGA to effectively monitor multiple chambers over time, reducing the total number of RGAs needed
3Reliability
If ROR testing is performed frequently to detect failures early, then detection timing is improved, but productivity and wafer throughput decrease
Solution Approach 1:
The patent enables continuous monitoring capability where the RGA can quickly cycle through multiple chambers and provide ongoing leak detection. This continuous measurement approach allows for early failure detection without requiring lengthy periodic ROR test cycles, thus maintaining both reliability and productivity
4Device complexity
If transfer chamber RGA systems are used for in-situ air leak detection, then equipment complexity is reduced, but measurement accuracy decreases during dynamic pressure changes
Solution Approach 1:
The patent implements preliminary pumping down of the transfer chamber to a stable vacuum level before initiating RGA measurements. This preliminary action stabilizes the pressure environment, eliminating the interference of dynamic pressure changes during wafer transfer and ensuring accurate leak detection measurements
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables efficient and sensitive leak detection in multiple vacuum chambers with reduced equipment complexity, allowing for faster throughput and earlier detection of failures, thereby improving the economic viability of semiconductor fabrication.
Implementation Method 1
measuring a first composition of the atmosphere in the host vacuum chamber using a residual gas analyzer (RGA)
Implementation Method 2
the atmosphere in the host vacuum chamber mixes with the atmosphere in the guest vacuum chamber to form a mixed atmosphere
Data Source
AI summary
A method of measuring an atmosphere in a guest vacuum chamber of a vacuum tool includes measuring a first composition of the atmosphere in the host vacuum chamber using a residual gas analyzer (RGA). The host and guest vacuum chambers are not coupled during the measuring of the first composition. The host vacuum chamber is coupled to the guest vacuum chamber, so the atmospheres in each can mix in the host vacuum chamber. A second composition of the atmosphere in the host vacuum chamber is measured using the RGA after the chambers are coupled. Using a processor, a composition of the guest atmosphere is automatically determined using the measured first and second compositions. A vacuum tool can include the host and guest chambers, the valve, the RGA, and a processor configured to control the valve to carry out this or other methods.