Vacuum Chamber Measurement Through a Secondary Gate Interface
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Solution Overview
Problem
Existing vacuum processing apparatuses face challenges in accurately measuring the state within the processing chamber without opening it to the atmosphere, as external measurement methods are less accurate and opening the chamber reduces productivity due to the need for temperature and moisture control adjustments, and transferring heavy measuring devices is impractical.
Innovation Solution
A measuring device with a case that attaches airtightly to a secondary gate of the processing chamber, equipped with a decompressing mechanism and a robot arm with a sensor to measure the chamber's state without exposing it to the atmosphere, allowing direct and accurate measurements within the chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the processing chamber is opened to the atmosphere for measurement, then measurement accuracy is improved, but productivity deteriorates due to temperature and moisture control adjustments
Solution Approach 1:
The system divides the processing chamber into two independent gates: a first gate for substrate loading/unloading and a second gate for measurement operations. This segmentation allows measurement activities to occur independently without affecting the main processing chamber environment, thereby maintaining productivity while enabling accurate measurements.
Solution Approach 2:
A measurement chamber is introduced as an intermediary space between the processing chamber and the external environment. The measurement chamber can be connected to either the processing chamber or the atmosphere, serving as a buffer that allows measurements to be performed without directly exposing the processing chamber to atmospheric conditions, thus avoiding temperature and moisture control issues.
2Measurement precision
If a measuring device is transferred into the processing chamber, then measurement accuracy is improved, but device complexity increases due to transfer system requirements
Solution Approach 1:
The system separates the measurement function from the substrate processing function by providing a dedicated measurement chamber with its own gate. This eliminates the need for complex transfer mechanisms to move heavy measuring devices into and out of the processing chamber, as the measurement chamber remains a stationary, dedicated component.
Solution Approach 2:
The second gate and measurement chamber are designed to serve multiple functions: they can be connected to the processing chamber for in-situ measurements, connected to the atmosphere for device access, or used to house various types of measurement equipment. This multi-functionality reduces the need for separate transfer systems for different measurement devices.
3Ease of operation
If the processing chamber is opened to the atmosphere for measurement, then direct measurement is enabled, but temperature and moisture control adjustments are required
Solution Approach 1:
The measurement chamber serves as an intermediary that can be selectively connected to either the processing chamber or the atmosphere. When connected to the processing chamber, it enables direct measurement without atmospheric exposure. When connected to the atmosphere, it allows device access while isolating the processing chamber from environmental fluctuations, eliminating the need for temperature and moisture control adjustments.
Solution Approach 2:
By separating the measurement operations into a distinct chamber with independent atmospheric connection capability, the system allows the processing chamber to maintain its controlled environment independently. The measurement chamber handles atmospheric interactions, protecting the main processing chamber from temperature and moisture control issues.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables high-accuracy measurements within the processing chamber without opening it to the atmosphere, reducing the need for transfer systems and maintaining productivity by allowing direct and precise data collection without exposing the chamber to external conditions.
Implementation Method 1
a decompressing mechanism configured to reduce a pressure in the case
Data Source
AI summary
A measuring device for a vacuum processing apparatus including a processing chamber having a first gate for loading and unloading a substrate and a second gate different from the first gate is provided. The measuring device includes a case having art opening that is sized to correspond to the second gate of the processing chamber and is airtightly attachable to the second gate, a decompressing mechanism configured to reduce a pressure in the case, and a measuring mechanism accommodated in the case and configured to measure a state in the processing chamber through the opening in a state where the pressure in the case is reduced by the decompressing mechanism.