Vacuum Deposition Layout for Flat Double-Sided Metal Coating

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Solution Overview

Problem

Existing vacuum deposition methods for coating both sides of a substrate face issues with temperature homogeneity, leading to flatness problems due to elastic deformation and non-uniform cooling, which affects the mechanical properties and surface aspect of the coated substrate.

Innovation Solution

The method involves positioning vapor ejectors at specific angles α and α′ within a vacuum chamber to ensure symmetrical temperature distribution and uniform thermal profile during deposition, using elongated ejectors with a slot shape and controlled rotation, ensuring uniform contact pressure with cooling rolls.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If multiple cooling rolls are installed to increase cooling efficiency and manage temperature, then cooling efficiency is improved, but temperature homogeneity deteriorates leading to flatness issues

Engineering Contradiction:
Improvecooling efficiencyVSAvoidflatness
Core Design Contradiction:
TemperatureVSManufacturing precision

Solution Approach 1:

The vapor ejectors are positioned asymmetrically relative to the substrate width, with specific angular orientations (α and α') that are not equal to each other. This asymmetric positioning creates a symmetrical temperature distribution pattern across the substrate width, ensuring uniform cooling and preventing flatness issues while maintaining high cooling efficiency through the multiple cooling rolls

Inventive Principle:
Principle #4Asymmetry

2Quantity of substance

If vapor ejectors are positioned to deposit coating on both sides of substrate, then coating coverage is improved, but temperature distribution becomes non-uniform causing deformation

Engineering Contradiction:
Improvecoating coverageVSAvoidtemperature distribution
Core Design Contradiction:
Quantity of substanceVSStability of the object's composition

Solution Approach 1:

Each vapor ejector is positioned with specific angular parameters (α and α') optimized for its location. The ejectors are oriented at different angles relative to the substrate normal, with their positioning calculated based on distances D1 and D2 from the substrate edges. This local optimization ensures that each ejector contributes to uniform temperature distribution in its specific zone while maintaining comprehensive coating coverage on both substrate sides

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach results in a flat and uniformly coated substrate with minimal deformation, improving mechanical properties and surface quality by maintaining consistent temperature distribution and contact pressure.

Implementation Method 1

a metallic vapor is ejected through at least two vapor ejectors (3, 3′), towards both sides of the running substrate and a layer of at least one metal is formed on each side by condensation of ejected vapors

Methodology Applied
Scientific EffectVapor condensation: Condensation

Implementation Method 2

a method of cooling the base steel sheet before and after a deposition process is performed, by installing cooling rolls

Methodology Applied
Scientific EffectThermal conduction: Conduction (thermal)

Implementation Method 3

When it comes to cooling devices, in order to obtain good cooling efficiency in a vacuum state, a plurality of cooling rolls may be installed, rather than a single cooling roll, to significantly increase an interface thereof. In particular, a rise in the temperature of the steel sheet may be significant after a coating process due to coating condensation enthalpy

Methodology Applied
Scientific EffectCondensation enthalpy: Latent Heat

Data Source

PatentUS12624441B2Vacuum deposition facility and method for coating a substrate
Publication Date: 2026.05.12 ARCELORMITTAL SA
  • US12624441B2 patent drawing
  • US12624441B2 patent drawing
  • US12624441B2 patent drawing

AI summary

A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal on both sides of the substrate and a coated metallic substrate.