Vacuum Etching-Coating Chamber for Fast Wear-Resistant Nonstick Deposition
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Solution Overview
Problem
Existing non-stick coatings on cooking utensils, such as PTFE, have limitations in temperature resistance and wear resistance, posing safety hazards and health risks, while current PVD processes are complex and costly, unsuitable for mass production of non-stick and wear-resistant coatings.
Innovation Solution
A coating equipment with separate etching and coating chambers in a vacuum state, utilizing a transfer mechanism for automated processing, and a vacuum device to maintain a seamless vacuum environment, enabling efficient deposition of a non-stick and wear-resistant coating layer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If PTFE coating is used for non-stick performance, then non-stick property is improved, but temperature resistance deteriorates (decomposes at 350°C)
Solution Approach 1:
The patent applies composite materials by combining multiple coating layers with different properties. Specifically, it uses a multi-layer coating structure including PTFE for non-stick performance and additional layers (such as aluminum oxide or other ceramic coatings) for enhanced temperature resistance and wear resistance, creating a composite coating system that leverages the strengths of each material
Solution Approach 2:
The patent segments the coating into multiple functional layers, each with specific properties. The coating system is divided into distinct layers: a base layer for adhesion, a PTFE layer for non-stick performance, and protective layers for temperature and wear resistance. This segmentation allows each layer to perform its specific function optimally
2Strength
If existing PVD process is used for wear-resistant coating, then wear resistance is improved, but device complexity increases and processing time extends to 3 hours
Solution Approach 1:
The patent merges multiple processing functions into a single integrated PVD chamber. The chamber can perform etching, coating deposition, and other surface treatments in sequence without breaking vacuum, combining what were previously separate processing steps into one continuous operation, thereby reducing device complexity and processing time
Solution Approach 2:
The patent implements continuous processing by maintaining vacuum conditions throughout the entire workflow. The PVD chamber allows sequential etching and coating operations to proceed continuously without vacuum breaking and re-establishment, eliminating idle time and reducing total processing time from 3 hours to a much shorter duration
3Strength
If existing PVD process is used for coating, then wear resistance is improved, but productivity decreases due to 3-hour processing cycle
Solution Approach 1:
The patent implements continuous processing by maintaining vacuum conditions throughout the entire workflow. The PVD chamber allows sequential etching and coating operations to proceed continuously without vacuum breaking and re-establishment, eliminating idle time and reducing total processing time from 3 hours to a much shorter duration, thereby significantly improving productivity
Solution Approach 2:
The patent performs preliminary etching of the substrate surface before coating deposition within the same vacuum chamber. This preliminary surface preparation creates optimal adhesion conditions for the subsequent coating layer, ensuring high-quality results while maintaining continuous operation and improving overall processing efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Significantly reduces processing time from 3 hours to 5-8 minutes, lowers production costs, and meets the demands of mass production while ensuring high-quality, stable coatings.
Implementation Method 1
the etching chamber is provided with a plasma source for processing the surface of the workpiece
Implementation Method 2
the coating chamber is provided with a sputtering cathode for sputtering the surface of the workpiece etched
Implementation Method 3
the vacuum device is configured to form a vacuum in at least one of the etching chamber and the coating chamber
Data Source
AI summary
A coating equipment and a coating method include an etching chamber, an entrance to etching process with a gate valve and an exit of etching process with a transfer valve; a coating chamber with a sputtering cathode, an entrance to coating process with a transfer valve and an exit of coating process with a gate valve in connection with the entrance to coating process; a transfer mechanism in the etching chamber and the coating chamber; a vacuum device in connection with the etching chamber and/or the coating chamber, the vacuum device is configured to form a vacuum in at least one of the etching chamber and the coating chamber; the exit of etching process is in a sealed connection with the entrance to coating process, so that the etching chamber and the coating chamber are in a same vacuum state in a working state of the coating equipment.