Vacuum Evacuation System with Shared Backup Pumps
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional vacuum evacuation systems for semiconductor manufacturing require a large installation space and high costs due to the need for multiple vacuum pumps, and they often fail to switch to backup pumps before the primary pump's rotational speed significantly decreases, leading to increased pressure in process chambers and apparatus shutdowns.
Innovation Solution
A vacuum evacuation system with a configuration of multiple first vacuum pumps, a second vacuum pump positioned near the first pumps, and a third vacuum pump in parallel, along with a backup system that switches operation from the primary pump to the backup before significant rotational speed loss, using multi-stage positive-displacement pumps and gas treatment devices to manage pressure and gas treatment effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If multiple vacuum pumps are coupled to each process chamber, then the reliability of vacuum evacuation is improved, but the installation space and system cost increase
Solution Approach 1:
The patent merges multiple vacuum pump functions into a shared architecture. Multiple process chambers share common vacuum pump units and backup pumps through collecting pipes, eliminating the need for dedicated pumps for each chamber. This combining approach maintains evacuation reliability across all chambers while significantly reducing the total number of pumps required, thereby reducing installation space and system cost.
Solution Approach 2:
The vacuum pump units are designed with multi-functionality to serve multiple process chambers simultaneously. The backup pumps can switch to support any process chamber experiencing pump failure, making the backup system universal rather than chamber-specific. This universality reduces the overall pump count needed while maintaining system reliability.
2Reliability
If a backup pump is provided for each vacuum pump, then the reliability during pump malfunction is improved, but the device complexity and cost increase
Solution Approach 1:
Instead of providing individual backup pumps for each vacuum pump unit, the patent combines backup functions into shared backup pumps that can serve multiple process chambers. The collecting pipes enable multiple chambers to access the same backup pump resources, reducing the total number of backup pumps needed while maintaining the ability to evacuate any chamber during pump failure.
Solution Approach 2:
The system implements dynamic switching capability where backup pumps can be activated to support any process chamber experiencing vacuum pump failure. The control system dynamically routes the evacuation demand from affected chambers to available backup pumps through the collecting pipe network, providing flexible and efficient backup coverage without requiring fixed one-to-one backup arrangements.
3Loss of time
If the backup pump switches after significant rotational speed decrease, then the response time is reduced, but the pressure in process chamber exceeds threshold causing shutdown
Solution Approach 1:
The control system performs preliminary monitoring of vacuum pump rotational speeds and proactively activates backup pumps when speed decreases are detected, before the primary pump fails completely or pressure thresholds are exceeded. This preliminary action allows the system to switch to backup support in advance, preventing apparatus shutdown while maintaining continuous operation.
Solution Approach 2:
The system implements feedback control by continuously monitoring the rotational speed of vacuum pumps and using this information to trigger backup pump activation. When the control system detects rotational speed decrease beyond a predetermined threshold, it automatically activates the backup pump through the collecting pipe network, creating a closed-loop control system that responds to actual pump performance conditions.
Data Source
AI summary
The present invention relates to a vacuum evacuation system used to evacuate a processing gas from one or more process chambers for use in, for example, a semiconductor-device manufacturing apparatus. The vacuum evacuation system is a vacuum apparatus for evacuating a gas from a plurality of process chambers (1). The vacuum evacuation system includes a plurality of first vacuum pumps (5) coupled to the plurality of process chambers (1) respectively, a collecting pipe (7) coupled to the plurality of first vacuum pumps (5), and a second vacuum pump (8) coupled to the collecting pipe (7).