Vacuum Hard Mask Carrier with Flexure Compensation
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Solution Overview
Problem
In semiconductor processing, hard masks used to deposit material on substrates often form particles when transitioning out of the vacuum environment, leading to contamination of substrates and processing chambers.
Innovation Solution
A substrate carrier apparatus with a hard mask assembly that includes an annular frame, a hard mask with predetermined openings, and spacer elements to maintain a gap between the mask and substrate, along with a flexure element to compensate for substrate thickness variations and ensure the mask remains horizontal, allowing for placement and removal in a vacuum environment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If masks are placed and removed in atmosphere, then ease of operation is improved, but particle generation increases causing contamination
Solution Approach 1:
The patent applies the inert environment principle by implementing a vacuum chamber that maintains a vacuum atmosphere during mask placement and removal operations. The vacuum environment prevents particle generation on the mask surface that occurs when masks are handled in atmospheric conditions, thereby eliminating contamination while still allowing for operational flexibility through automated loading mechanisms.
2Manufacturing precision
If mask is placed close to substrate, then deposition precision is improved, but contamination risk increases due to particle fallout
Solution Approach 1:
The vacuum chamber creates an inert environment that prevents particle generation and fallout, allowing the mask to be positioned close to the substrate for high deposition precision without the risk of contamination from particles that would form in atmospheric conditions.
3Ease of operation
If mask structure is simplified for easy handling, then ease of operation is improved, but mask stability deteriorates
Solution Approach 1:
The mask assembly is segmented into separate components including the mask itself, support structure, and loading mechanism. This segmentation allows the mask to be designed for stability while the support and loading components provide ease of operation through automated handling within the vacuum chamber.
Solution Approach 2:
An intermediary loading mechanism serves as a mediator between the external atmosphere and the vacuum chamber, enabling mask placement and removal operations without requiring the mask to be directly handled in atmospheric conditions, thus maintaining both stability and ease of operation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Minimizes particle generation on the hard mask, preventing contamination of substrates and processing chambers by maintaining the mask in a vacuum environment during placement and removal.
Implementation Method 1
a flexure element coupled to the annular frame and configured to compensate for substrate thickness variations
Data Source
AI summary
Substrate carrier apparatus having a hard mask are disclosed herein. In some embodiments, a substrate carrier apparatus includes a carrier body having a support surface to support a substrate; and a mask assembly disposed above the support surface. The mask assembly includes an annular frame disposed atop the support surface; and a hard mask coupled to and disposed within the annular frame above the support surface, wherein the hard mask includes one or more openings arranged in a predetermined pattern and disposed through the hard mask, and wherein the hard mask includes a plurality of spacer elements extending from a bottom surface of the hard mask.