Vacuum Nano-Object Transfer for Clean Carbon Nanotube Deposition
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Solution Overview
Problem
Existing methods for integrating carbon nanotubes into electronic components suffer from defects, contamination, and lack of control over the interface, leading to degraded properties and reduced reproducibility, integration success rate, and stability.
Innovation Solution
A process and device using a comb-shaped support with adjustable optical and mechanical control under vacuum conditions to transfer nano-objects, such as carbon nanotubes, onto a substrate, minimizing contact areas and enabling precise alignment and electrical measurement for cleaner, more reproducible integration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional lithography techniques are used, then manufacturing process is simple, but manufacturing precision deteriorates at 10 nanometer node and below
Solution Approach 1:
The lithography process is segmented into multiple steps: forming mandrels at a first pitch, depositing spacers, selectively removing portions, and repeating the process to achieve features at a finer second pitch. This multi-step segmentation enables sub-10nm precision that cannot be achieved with conventional single-step lithography.
Solution Approach 2:
Mandrels are formed in advance as sacrificial structures that define the positions of subsequent features. The spacers are deposited preliminarily on these mandrels, and the mandrels are then selectively removed. This preliminary action of forming mandrels enables precise positioning of final features at sub-lithographic dimensions.
2Manufacturing precision
If wafer fabrication is used, then manufacturing precision is high, but productivity deteriorates due to high cost and low throughput
Solution Approach 1:
The spacer structures self-align to the mandrels through conformal deposition, automatically defining their positions and dimensions based on the mandrel geometry. This self-service mechanism eliminates the need for additional alignment steps and complex lithography processes, enabling high precision manufacturing with simpler, more productive processes.
3Manufacturing precision
If pitch quartering techniques are used, then manufacturing precision is improved, but device complexity increases due to multiple lithography steps
Solution Approach 1:
Mandrels serve as intermediary sacrificial structures that enable the formation of finer features through spacer deposition. The mandrels are formed at a relaxed pitch using conventional lithography, then spacers are deposited on them and the mandrels are removed, effectively quartering the pitch without requiring multiple complex lithography exposure steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances the cleanliness and reproducibility of nano-object integration, improves the interface control, and increases the stability and integration success rate of carbon nanotubes in electronic devices.
Implementation Method 1
a deposition device configured to deposit the nano-objects onto the substrate
Data Source
Figure 1~2
Figure 3~4
Figure 5~6c
AI summary
The present invention relates to a method for depositing an object (6), comprising: - approaching, in an enclosure, a holder in the direction of a carrier substrate (5), then - transferring, in the enclosure, the object from the holder to an area for depositing (7) the carrier substrate. The transfer step is preferably carried out when the inside of the enclosure is in a vacuum at a pressure below 10 -6 bar.