Vacuum Plating Parameter Optimization for Thin Film Properties

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Solution Overview

Problem

The existing vacuum plating processes require numerous experimental trials and errors to optimize process parameters, which are costly in terms of manpower, resources, and time, and lack a systematic approach to link process parameters to thin film properties.

Innovation Solution

An optimization method for vacuum plating processes that involves determining the property of the thin film to be optimized, selecting process parameters and their levels, designing a series of experiments, fitting a multi-dimensional quadratic transformation function, and dynamically modifying it through iteration to obtain a best fitting function, which is used to determine the optimal process parameter combination.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If traditional trial-and-error method is used to optimize process parameters, then thin film properties can be improved, but the cost in terms of manpower, resources and time increases significantly

Engineering Contradiction:
Improvethin film property optimizationVSAvoidoptimization time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent transforms process parameters into standardized variables and uses mathematical transformation functions to map these parameters to thin film properties. This allows systematic exploration of parameter spaces through controlled experiments rather than random trial-and-error, significantly reducing optimization time while maintaining precision.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent implements an iterative optimization process where experimental results are fed back into the transformation function to refine predictions. The system continuously improves the mapping between process parameters and thin film properties through accumulated data, enabling faster convergence to optimal parameters without requiring exhaustive experimentation.

Inventive Principle:
Principle #23Feedback

2Manufacturing precision

If traditional trial-and-error method is used to optimize process parameters, then thin film properties can be improved, but the cost in terms of manpower and resources increases significantly

Engineering Contradiction:
Improvethin film property optimizationVSAvoidraw material consumption
Core Design Contradiction:
Manufacturing precisionVSQuantity of substance

Solution Approach 1:

By transforming process parameters into standardized variables and using mathematical models to predict thin film properties, the system identifies optimal parameter combinations with minimal experimentation. This reduces the number of experimental runs required, thereby decreasing raw material consumption while achieving the same optimization quality.

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If traditional trial-and-error method is used, then process optimization can be achieved, but the ability to link process parameters to thin film properties systematically is lost

Engineering Contradiction:
Improveprocess optimizationVSAvoidparameter-property relationship
Core Design Contradiction:
Manufacturing precisionVSLoss of information

Solution Approach 1:

The patent establishes explicit mathematical transformation functions that map process parameters to thin film properties. These functions preserve and formalize the relationships between parameters and properties, enabling systematic understanding and prediction rather than relying on fragmented empirical observations from trial-and-error methods.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20250164981A1Optimization method for vacuum plating process
Publication Date: 2025.05.22 IND TECH RES INST
  • US20250164981A1 patent drawing
  • US20250164981A1 patent drawing
  • US20250164981A1 patent drawing

AI summary

An optimization method for a vacuum plating process includes following steps. A property of a thin film to be optimized is determined. According to the property of the thin film to be optimized, process parameters and a level of each of the process parameters are determined. M sets of experiments are designed, where M is a positive integer, M is positively related to a number of the process parameters, but M is not related to a number of the level of the process parameters. The M sets of experiments are performed to obtain M sets of test films and the property of each of the test films are measured or calculated. Process parameters used in the M sets of experiments and the property of the M sets of test films are fitted with a multi-dimensional quadratic transformation function to obtain a first fitting function. The first fitting function is dynamically modified using an iteration method to obtain a best fitting function. A multi-dimensional response surface diagram is illustrated using the best fitting function to determine an optimal process parameter combination.