Vacuum-Preloaded Gas Bearing Deposition Head for Uniform Coating
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Solution Overview
Problem
Current spatial atomic layer deposition (SALD) systems face challenges in coating large substrates efficiently due to the need for complex equipment or long motion profiles, and there is a lack of modular systems that can handle different substrate form factors and prevent non-uniformity or defects in thin-film coatings.
Innovation Solution
A vacuum-preloaded gas bearing deposition head system that allows for the coating of substrates larger than the deposition head by maintaining a net force and moment equilibrium, enabling the use of smaller deposition heads and simpler motion profiles, and accommodating various substrate lengths and forms with a modular design.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a deposition head smaller than the substrate area is used, then manufacturing cost and complexity are reduced, but coating uniformity and coverage become problematic
Solution Approach 1:
The deposition head is divided into multiple independently controllable source openings arranged in a pattern, allowing different regions to deposit at different rates or with different materials, enabling uniform coating of large substrates using a compact head design
Solution Approach 2:
The patent transitions from temporal deposition control to spatial distribution control by arranging multiple source openings in a two-dimensional pattern across the deposition head face, enabling simultaneous multi-point deposition that maintains uniformity across large substrates
2Area of stationary object
If complex equipment or long motion profiles are used, then large substrates can be coated, but device complexity and manufacturing cost increase
Solution Approach 1:
The deposition head is divided into multiple independently controllable source openings arranged in a pattern, allowing different regions to deposit at different rates or with different materials, enabling uniform coating of large substrates using a compact head design
Solution Approach 2:
The system uses the substrate's own motion through the deposition zone to achieve coating, eliminating the need for complex reciprocating motion mechanisms. The substrate moves unidirectionally while the deposition head remains stationary, simplifying the overall system architecture
3Stability of the object's composition
If vacuum pre-loading is applied, then substrate positioning stability is improved, but system complexity increases
Solution Approach 1:
A gas-bearing backer is introduced as an intermediary between the substrate and the deposition head. This backer layer, combined with vacuum pre-loading, creates a controlled gas bearing that stabilizes substrate positioning without requiring direct mechanical contact or complex positioning mechanisms
Solution Approach 2:
The system creates a controlled vacuum environment between the deposition head and substrate, using vacuum pre-loading to establish stable positioning. The vacuum acts as an inert environment that eliminates external disturbances and maintains consistent substrate-head spacing throughout the deposition process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient coating of larger substrates with uniformity and flexibility, allowing for roll-to-roll processing and reduced manufacturing costs while preventing substrate distortion and exposure to external environments during deposition.
Implementation Method 1
a vacuum-preloaded gas bearing deposition head positioned in an external environment having an ambient pressure
Implementation Method 2
vacuum-preloaded gas bearing deposition head
Implementation Method 3
Among the techniques widely used for thin-film deposition is chemical vapor deposition (CVD), which uses chemically reactive molecules that react to deposit a desired film on a substrate
Implementation Method 4
In ALD, deposition of an atomic layer is the outcome of a chemical reaction between a reactive molecular precursor and the substrate
Implementation Method 5
an exhaust pressure at the exhaust openings is less than ambient pressure and a source pressure at the source openings is greater than the exhaust pressure that at the exhaust openings
Data Source
AI summary
A thin film deposition system includes a vacuum-preloaded gas bearing deposition head positioned in an external environment having an ambient pressure, the deposition head having an output face including a plurality of source openings through which gaseous materials are supplied and one or more exhaust openings. An exhaust pressure at the exhaust openings is less than ambient pressure, and a source pressure at the source openings is greater than that at the exhaust openings, with the pressure at the outermost source openings being greater than ambient pressure. A motion control system moves a substrate unit over the output face in the in-track direction without constraining its motion in a direction normal to the output face to a point where a center of gravity of the substrate unit is beyond the first edge of the output face.