Vacuum Processing Device Transport Control Algorithm
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Solution Overview
Problem
Vacuum processing devices with multiple process chambers face challenges in achieving high throughput due to varying process times across different chambers, leading to inefficient transportation control and reduced productivity, especially when processing different types of products in parallel.
Innovation Solution
A vacuum processing device with a control unit that updates real-time device state information to select the most efficient transport algorithm, optimizing the routing of wafers among multiple transportation robots and buffer rooms based on the number and arrangement of process chambers and their respective process times, ensuring high transportation efficiency even when process chamber changes are not allowed once wafer transportation starts.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple process chambers are used to improve throughput, then productivity increases, but transportation control becomes inefficient due to varying process times
Solution Approach 1:
The patent implements dynamic transportation control that adapts to varying process conditions. The control unit continuously monitors the state of multiple process chambers and dynamically adjusts wafer routing decisions based on real-time process time variations, chamber availability, and queue conditions. This dynamic approach allows the system to optimize throughput by routing wafers through chambers that will be available soonest, rather than following fixed routing patterns.
Solution Approach 2:
The system incorporates feedback mechanisms where the control unit receives real-time information about process chamber states, wafer processing progress, and transportation status. Based on this feedback, the control unit continuously updates routing decisions to minimize idle time and optimize throughput. The feedback loop enables the system to respond to variations in process times and chamber availability, maintaining high transportation efficiency despite the complexity of multiple chambers.
2Productivity
If multiple transportation robots are deployed to handle multiple process chambers, then throughput improves, but system complexity increases
Solution Approach 1:
The control unit is designed as a universal controller that manages multiple transportation robots and process chambers through a unified routing algorithm. Rather than requiring separate control systems for each robot-chamber pair, the single control unit handles all transportation decisions, wafer routing, and coordination. This universal approach reduces control complexity while maintaining the capability to manage multiple robots efficiently.
Solution Approach 2:
The system manages complexity by dynamically changing routing parameters based on current system state. The control unit adjusts transportation parameters such as which robot handles which wafer, which chamber receives which wafer next, and the timing of transportation operations. By parameterizing the control logic and adapting parameters in real-time, the system handles the complexity of multiple robots without requiring complex hardwired control for each possible scenario.
3Ease of operation
If wafer routing is fixed once transportation starts, then control is simplified, but throughput is reduced when process chamber availability varies
Solution Approach 1:
The control unit performs preliminary routing decisions before wafer transportation begins, determining the optimal path through multiple process chambers based on predicted chamber availability and process times. This preliminary action establishes an initial routing plan that can be executed with relatively simple control during transportation. The advance planning allows the system to prepare optimal routes without requiring complex real-time adjustments during the actual transportation process.
Solution Approach 2:
While maintaining operational simplicity, the system dynamically adjusts routing decisions at key decision points. When a wafer approaches a process chamber, the control unit evaluates current chamber states and updates the routing decision if a better option becomes available. This dynamic adjustment at critical moments improves throughput without requiring continuous complex control throughout the entire transportation process, balancing simplicity and adaptability.
Data Source
AI summary
Transportation control in a vacuum processing device with high transportation efficiency without lowering throughput is provided. A control unit is configured to update in real time and holds device state information showing an action state of each of a process chamber, a transportation mechanism unit, a buffer room, and a holding mechanism unit, the presence of a process subject member, and a process state thereof; select a transport algorithm from among transport algorithm judgment rules that are obtained by simulating in advance a plurality of transport algorithms for controlling transportation of a process subject member for each condition of a combination of the number and arrangement of the process chambers and process time of a process subject member based on the device state information and process time of the process subject member; and compute a transport destination of the process subject member based on the selected transport algorithm.