Vacuum Processing Apparatus Intermediate Wall Exhaust
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Solution Overview
Problem
Current vacuum processing apparatuses for semiconductor manufacturing are bulky and complex, making them difficult to miniaturize and maintain, particularly due to the need for multiple exhaust ports and complicated piping arrangements.
Innovation Solution
The apparatus features a configuration with a first and second transfer space inside a processing container, separated by an intermediate wall with joined exhaust paths, allowing for efficient gas circulation and exhaust through a single exhaust pipe, simplifying the design and reducing size while maintaining uniform processing conditions across multiple processing spaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If multiple exhaust ports and complicated piping arrangements are used for multiple processing spaces, then each processing space can be exhausted independently, but the apparatus becomes bulky and complex
Solution Approach 1:
The patent combines multiple exhaust paths into a single exhaust port located in the intermediate wall. The intermediate wall contains multiple exhaust paths that correspond to different processing spaces, and these paths merge into one common exhaust port, eliminating the need for multiple separate exhaust ports and complicated piping arrangements while maintaining the ability to exhaust multiple processing spaces
Solution Approach 2:
The single exhaust port in the intermediate wall serves multiple functions by providing exhaust capability for multiple processing spaces through the multiple exhaust paths within the wall structure, making one component perform the work of what would traditionally require multiple separate exhaust systems
2Reliability
If multiple exhaust ports are provided for multiple processing spaces, then each space can be exhausted separately, but the apparatus size increases
Solution Approach 1:
Multiple exhaust functions are merged into a single exhaust port location in the intermediate wall, reducing the number of exhaust port openings required in the apparatus structure and thereby reducing the overall apparatus footprint while maintaining exhaust capability for all processing spaces
3Productivity
If a conventional exhaust configuration is used, then the apparatus can handle multiple processing spaces, but maintainability deteriorates
Solution Approach 1:
The exhaust paths are merged within the intermediate wall structure, creating a compact and integrated exhaust system that is easier to access and maintain. The intermediate wall serves as a centralized location for all exhaust path connections, simplifying maintenance operations compared to distributed exhaust ports throughout the apparatus
Data Source
AI summary
There is provided a vacuum processing apparatus for performing a vacuum process by supplying a processing gas onto a substrate arranged in a processing space kept in a vacuum atmosphere, the apparatus comprising: a first transfer space and a second transfer space in each of which the substrate is transferred; and an intermediate wall portion provided between the first transfer space and the second transfer space along the extension direction, wherein one or more processing spaces are arranged in the first transfer space along the extension direction, and two or more processing spaces are arranged in the second transfer space along the extension direction, and wherein a plurality of exhaust paths and a joined exhaust path where the plurality of exhaust paths are joined are formed in the intermediate wall portion.